ULPMAT

Iron Magnesium Alloy

Chemical Name:
Iron Magnesium Alloy
Formula:
FeMg
Product No.:
261200
CAS No.:
EINECS No.:
Form:
Sputtering Target
HazMat:
Product ID Formula Purity Dimension Inquiry
261200ST001 FeMg 99.95% Ø 152.4 mm x 3.175 mm Inquire
Product ID
261200ST001
Formula
FeMg
Purity
99.95%
Dimension
Ø 152.4 mm x 3.175 mm

Iron Magnesium Alloy Sputtering Targets Overview

Iron magnesium alloy sputtering targets are lightweight metal alloy targets primarily used for functional thin film preparation, material modification, and related research and industrial applications.

We can provide iron-magnesium alloy targets with various composition ratios and specifications to meet different equipment and process requirements. Please contact us for a suitable solution.

Product Highlights

Controllable Composition
Stable Sputtering Process
Compatible with Multiple PVD Deposition Processes
Supports Custom Sizes and Composition Ratios
Stable Delivery Cycle

Applications of Iron-Magnesium Alloy Sputtering Targets

Functional Thin Film Deposition: Iron-magnesium alloy sputtering targets can be used to prepare metal and alloy thin films with specific mechanical or functional properties, suitable for research and some industrial applications.

Material Surface Modification: Depositing iron magnesium alloy thin films on metal or substrate surfaces helps to adjust surface properties, such as structural stability or functional response characteristics.

Lightweight Metal Research: Iron magnesium alloys are commonly used in experimental research on lightweight metal materials and can serve as sputtering materials for exploring novel alloy systems.

Scientific Research and Laboratory Applications: Suitable for fundamental research in universities and research institutions on alloy thin films, growth mechanisms, and process parameters.

FAQs

Q1: Which sputtering method is suitable for iron magnesium alloy sputtering targets?
A1: They can be used for DC or RF sputtering, depending on the equipment configuration and process requirements.

Q2: Can the alloy composition ratio be adjusted?
A2: Yes, we support customization of different iron-magnesium ratios based on specific application goals.

Q3: Is this target prone to instability during sputtering?
A3: Under reasonable process parameters, the target sputtering process is stable and yields uniform thin films.

Q4: Is this target mainly used for research or industry?
A4: It is suitable for both research experiments and some pilot-scale and industrial applications.

Reports

Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request

Why Choose Us?

We focus on a stable supply of metal and alloy sputtering targets, emphasizing composition control, processing consistency, and technical communication efficiency, enabling us to provide reliable and sustainable material support for thin film projects at different stages.

Molecular formula: FeMg
Appearance: Silver-gray
Crystal structure: Body-centered cubic (BCC)

Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.

Outer Packaging: Cartons or wooden crates selected based on size and weight.

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