Iron Gallium Boron sputtering targets are ternary alloy sputtering targets, specifically designed as core sputtering source materials for preparing high-performance soft magnetic thin films and magnetoelectric functional coatings.
We offer Iron Gallium Boron alloy targets with precise composition and diverse specifications, and support customized backplane bonding. Please contact us for detailed technical solutions.
Precise alloy composition
Dense and uniform structure
Excellent magnetic properties
High sputtering stability
Customizable backplane and bonding
Microwave Communication Devices: Used to prepare soft magnetic thin films in devices such as high-frequency inductors and microwave isolators, meeting the demands of modern communication for miniaturization and high performance.
Precision Magnetic Sensors: As a core sputtering source, depositing highly sensitive magnetoresistive or magnetostrictive thin films, widely used in current detection, biomagnetic sensing, and other fields.
Advanced Data Storage: Used for fabricating key magnetic functional layers in writing heads or magnetic random access memory (MRAM), helping to improve storage density and speed.
Intelligent Surface Engineering: This technology uses sputtering to create composite coatings on precision components, combining wear resistance with specific magnetic properties to enhance overall product performance.
Q1: Is the permeability of iron gallium boron (FeGaB) targets high? Does it affect magnetron sputtering?
A1: This alloy has high permeability. In magnetron sputtering, this may shield the magnetic field to some extent. We ensure stable operation in high-performance magnetron sputtering systems by optimizing target thickness and magnetic circuit design.
Q2: How do you ensure the magnetic properties of the sputtered film meet expectations?
A2: The magnetic properties of the film depend on the target composition, purity, and sputtering process. We provide high-purity targets with precise composition and can provide guidance on key process parameters (such as power and gas pressure) to ensure film performance.
Q3: What special considerations are needed during target installation?
A3: The key to installation is ensuring good thermal conductivity and tight contact between the target and the cooling backplate. Improper installation can lead to poor heat dissipation, potentially causing target cracking or performance degradation.
Q4: Are iron gallium boron alloy sputtering targets suitable for reactive sputtering?
A4: Yes. Reactive sputtering in a mixed atmosphere of argon and nitrogen or oxygen can produce compound thin films such as iron gallium boron nitride or iron gallium boron oxide to expand their functional applications.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We specialize in the research and precision manufacturing of high-performance alloy sputtering targets. For functional materials like iron gallium boron, we not only ensure absolute accuracy and extremely high purity of their composition, but also guarantee a highly uniform and dense microstructure of the target material through advanced metallurgical technology.
Molecular formula: FeGaB
Appearance: Grayish-black
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
