Iron chromium molybdenum niobium boron alloy sputtering targets are multi-component high-performance alloy sputtering targets used to deposit cutting-edge functional coatings with ultra-high hardness, excellent wear resistance, and high-temperature oxidation resistance.
We can precisely control the alloy composition and ratio, providing customized target specifications and professional backplate bonding services. Please contact us to discuss your specific needs.
Multi-component reinforcement
Superior overall performance
High coating hardness
Deep customization supported
Excellent batch stability
High-Temperature Wear-Resistant Coatings: Used in extreme environments such as aero-engine blades and turbine components. The deposited coating can simultaneously resist high-temperature oxidation, wear, and corrosion, significantly extending the life of core components.
Precision Tool Strengthening: Applied to surface coating of high-performance cutting tools and stamping dies, significantly improving their red hardness, wear resistance, and service life to meet the needs of high-efficiency precision machining.
Special Environment Protection: Provides integrated protection solutions for equipment components operating under highly corrosive and high-wear conditions in the chemical and energy sectors.
Cutting-Edge Materials Research: Serving as a key raw material for developing novel high-entropy alloys, metallic glasses, or advanced wear-resistant thin films, it supports cutting-edge scientific research and the exploration of new materials.
Q1: Can the composition ratio of this multi-element alloy, the iron chromium molybdenum niobium boron alloy sputtering target, be adjusted?
A1: Yes. The content of elements such as chromium, molybdenum, niobium, and boron can be optimized according to your specific focus on the coating’s hardness, toughness, and temperature resistance.
Q2: What are the special requirements for the sputtering process of the iron chromium molybdenum niobium boron alloy sputtering target?
A2: It is recommended to use a medium-high frequency power supply and appropriately increase the sputtering power to ensure uniform ionization deposition of each element in the alloy, resulting in a thin film with a composition closer to that of the target material.
Q3: Must the target be bonded to a backplate?
A3: Bonding is strongly recommended. Bonding with a high thermal conductivity backplate (such as oxygen-free copper) can effectively dissipate heat and prevent this complex alloy target from cracking due to thermal stress during sputtering.
Q4: How to store it to maintain performance? A4: Store in a dry, clean environment, avoiding moisture and impact. For long-term storage, vacuum packaging or inert gas protection is recommended.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We specialize in the research and preparation of high-performance alloy sputtering targets with complex compositions, possessing precise component ratios and metallurgical control capabilities. We not only provide high-performance, stable sputtering target products, but also offer comprehensive technical support based on our extensive experience, from material selection and process adaptation to application analysis. We are your reliable partner in overcoming the challenges of coating in harsh working conditions.
Molecular formula: FeCrMoNbB
Appearance: Grayish-black
Crystal structure: Body-centered cubic (BCC)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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