ULPMAT

Indium Zinc Tin Oxide (IZTO)

Chemical Name:
Indium Zinc Tin Oxide (IZTO)
Formula:
In2O3-ZnO-SnO2
Product No.:
49083008500800
CAS No.:
EINECS No.:
Form:
Sputtering Target
HazMat:
Product ID Formula Purity Dimension Inquiry
49083008500800ST001 In2O3:ZnO:SnO2 (90:7:3 wt%) 99.99% Ø 25.4 mm x 6.35 mm Inquire
49083008500800ST002 In2O3:ZnO:SnO2 (90:7:3 wt%) 99.99% Ø 50.8 mm x 6.35 mm Inquire
49083008500800ST003 In2O3:ZnO:SnO2 (90:7:3 wt%) 99.99% Ø 76.2 mm x 6.35 mm Inquire
49083008500800ST004 In2O3:ZnO:SnO2 (90:7:3 wt%) 99.99% Ø 101.6 mm x 3.175 mm Inquire
49083008500800ST005 In2O3:ZnO:SnO2 (90:7:3 wt%) 99.99% Ø 101.6 mm x 6.35 mm Inquire
Product ID
49083008500800ST001
Formula
In2O3:ZnO:SnO2 (90:7:3 wt%)
Purity
99.99%
Dimension
Ø 25.4 mm x 6.35 mm
Product ID
49083008500800ST002
Formula
In2O3:ZnO:SnO2 (90:7:3 wt%)
Purity
99.99%
Dimension
Ø 50.8 mm x 6.35 mm
Product ID
49083008500800ST003
Formula
In2O3:ZnO:SnO2 (90:7:3 wt%)
Purity
99.99%
Dimension
Ø 76.2 mm x 6.35 mm
Product ID
49083008500800ST004
Formula
In2O3:ZnO:SnO2 (90:7:3 wt%)
Purity
99.99%
Dimension
Ø 101.6 mm x 3.175 mm
Product ID
49083008500800ST005
Formula
In2O3:ZnO:SnO2 (90:7:3 wt%)
Purity
99.99%
Dimension
Ø 101.6 mm x 6.35 mm

Indium Zinc Tin Oxide sputtering target Overview

Indium Zinc Tin Oxide sputtering target is a high-purity compound material widely used in thin film electronics, optoelectronic devices, and transparent conductive oxide (TCO) applications. With its excellent electrical conductivity, optical transparency, and uniform film formation, Indium Zinc Tin Oxide sputtering target plays an essential role in thin film deposition for advanced display, solar, and semiconductor technologies. Our targets ensure 99.99% (4N) purity, dense structure, and stable sputtering performance for industrial and research applications.

We supply high-quality IZTO sputtering targets for research institutions and manufacturers. Customizable ratio.Contact us for the best price and technical support.

Product Highlights of Indium Zinc Tin Oxide Sputtering Target

Superior Purity: 99.99% (4N) purity meets stringent requirements for TCO and thin film applications.
Customizable Composition: In:Zn:Sn ratios and target dimensions can be adjusted according to deposition requirements.
High Performance: Excellent electrical conductivity, optical transparency, and stable sputtering characteristics.
Stable Material: Dense structure, uniform composition, and low impurity levels ensure reproducible thin film results.

Applications of High-Quality Indium Zinc Tin Oxide (IZTO) Sputtering Target

Thin Film Electronics: Applied in transparent electrodes, thin film transistors, and display panels.
Optoelectronic Devices: Used in OLEDs, photodetectors, infrared sensors, and touch panels.
Solar Cells: Suitable for buffer and transparent electrode layers in CIGS and other advanced solar cells.
Research and Development: Widely used in laboratories for material science and device research.
Energy Devices: Applied in transparent conductive films for energy storage and conversion applications.

Why Choose Us?

Industry Expertise: Specialized in supplying high-purity sputtering targets for TCO and thin film technologies.
Customized Solutions: Flexible in target composition, dimensions, and purity specifications.
Reliable Quality: Strict impurity control, dense structure, and uniform composition ensure stable performance.
Global Delivery: Fast, secure shipping worldwide with protective packaging.
Technical Support: Professional team provides full technical documentation and consultation.

FAQs

F1. What is the purity of yourIndium Zinc Tin Oxide (IZTO) sputtering targets?
A1. Our targets have a standard purity of 99.99% (4N), ensuring reliable results for advanced thin film and optoelectronic applications.

F2. Can the composition or target size of In2O3-ZnO-SnO2 targets be customized?
A2. Yes, we offer customizable In:Zn:Sn ratios and target dimensions according to your deposition system requirements.

F3. How should In2O3-ZnO-SnO2 sputtering targets be stored?
A3. Store in a cool, dry environment, away from moisture and contaminants, in protective packaging.

F4. What industries use In2O3-ZnO-SnO2 sputtering targets?
A4. Widely used in thin film electronics, optoelectronics, solar cells, semiconductors, and research laboratories.

Reports

Each batch of products is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports are available upon request to meet industrial and research standards.

Chemical Formula: In₂O₃–ZnO–SnO₂
Appearance: Off-white or silver-gray dense target
Melting Point: ~1900°C
Boiling Point: ~2000°C
Crystal Structure: Cubic (In₂O₃ as the primary phase)
Binding Method: Adhesive bonding or mechanical fixing options available
Backing Plate Selection: Copper (Cu), Aluminum (Al), or Stainless Steel (SS), selectable based on target size and deposition equipment

Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.

Outer Packaging: Cartons or wooden crates selected based on size and weight.

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