| Product ID | Formula | Purity | Dimension | Inquiry |
|---|---|---|---|---|
| 4908500800ST001 | In2O3-SnO2 (90/10 wt%) | 99.99% | Ø 50.8 mm x 3.175 mm | Inquire |
| 4908500800ST002 | In2O3-SnO2 (95/5 wt%) | 99.99% | Ø 50.8 mm x 6.35 mm | Inquire |
| 4908500800ST003 | In2O3-SnO2 (90/10 wt%) | 99.99% | Ø 76.2 mm x 6.35 mm | Inquire |
| 4908500800ST004 | In2O3-SnO2 (95/5 wt%) | 99.99% | Ø 101.6 mm x 4 mm | Inquire |
| 4908500800ST005 | In2O3-SnO2 (90/10 wt%) | 99.99% | Ø 101.6 mm x 6.35 mm | Inquire |
| 4908500800ST006 | In2O3-SnO2 (90/10 wt%) | 99.99% | Ø 152.4 mm x 3.175 mm | Inquire |
| 4908500800ST007 | In2O3-SnO2 (90/10 wt%) | 99.99% | Ø 152.4 mm x 6.35 mm | Inquire |
| 4908500800ST008 | In2O3-SnO2 (90/10 wt%) | 99.99% | Ø 203.2 mm x 3.175 mm | Inquire |
Indium Tin Oxide sputtering target (In2O3-SnO2) is a high-purity transparent conductive oxide (TCO) material widely used in thin film electronics, optoelectronic devices, and semiconductor applications. With excellent electrical conductivity, optical transparency, and uniform film formation, ITO sputtering targets are essential for manufacturing advanced displays, touch panels, solar cells, and other thin film devices. Our targets ensure 99.99% (4N) purity, dense structure, and stable performance for industrial and research applications.
We supply high-quality ITO sputtering targets for manufacturers and research institutions. Contact us for the best price and technical support.
Superior Purity: 99.99% (4N) purity meets stringent requirements for thin film and TCO applications.
High Performance: Excellent electrical conductivity and optical transparency for optoelectronic devices.
Stable Material: Dense structure, low impurity content, and uniform composition ensure reproducible thin film results.
Flexible Sizes: Available in various dimensions to suit different deposition systems.
Thin Film Electronics: Applied in transparent electrodes, thin film transistors (TFTs), and OLED displays.
Optoelectronic Devices: Used in touch panels, photodetectors, infrared sensors, and flexible electronics.
Solar Cells: Suitable for transparent electrode layers in advanced CIGS and perovskite solar cells.
Research and Development: Widely used in laboratories for material science and device research.
Energy Devices: Applied in transparent conductive films for energy conversion and storage applications.
Industry Expertise: Specialized in high-purity sputtering targets for TCO and thin film technologies.
Customized Solutions: Flexible in target composition, dimensions, and backing plate selection.
Reliable Quality: Strict impurity control, dense structure, and uniform composition ensure stable performance.
Global Delivery: Fast, secure shipping worldwide with protective packaging.
Technical Support: Professional team provides full technical documentation and consultation.
F1. What is the purity of your In2O3-SnO2 sputtering targets?
A1. Our ITO targets have a standard purity of 99.99% (4N), ensuring reliable results for advanced thin film and optoelectronic applications.
F2. Can the In:Sn ratio or target size be customized?
A2. Yes, we provide customizable In:Sn ratios and target dimensions according to your deposition system requirements.
F3. How should In2O3-SnO2 targets be stored and handled?
A3. Store in a cool, dry environment in sealed containers. Avoid moisture, dust, and contamination during handling.
F4. What industries commonly use In2O3-SnO2 targets?
A4. Widely used in thin film electronics, OLED displays, touch panels, solar cells, optoelectronics, and research laboratories.
F5. Are technical reports available for industrial or research purposes?
A5. Yes, each batch comes with COA, TDS, MSDS, and ICP-MS impurity reports. Third-party testing reports are available upon request.
Each batch of products is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports are available upon request to meet industrial and research standards.
Molecular Formula: In₂O₃-SnO₂
Appearance: Off-white or silver-gray dense target
Melting Point: ~1900°C
Boiling Point: ~2000°C
Crystal Structure: Cubic (In₂O₃ as the primary phase)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
