Indium-Gallium-Zinc Oxide (IGZO)

Indium-Gallium-Zinc Oxide Sputtering Target Overview

Indium-Gallium-Zinc Oxide (In2O3-Ga2O3-ZnO) sputtering target is a high-purity transparent oxide semiconductor material widely used in thin film transistors (TFTs), flat panel displays, and optoelectronic devices. With excellent electrical performance, high mobility, and uniform composition, IGZO sputtering targets are essential for advanced display technologies such as OLEDs and LCDs, as well as for research in semiconductor devices. Our targets ensure 99.99% (4N) purity, dense structure, and stable performance for industrial and research applications.

We supply high-quality Indium-Gallium-Zinc Oxide sputtering targets for manufacturers and research institutions. Contact us for the best price and technical support.

Product Highlights of In2O3-Ga2O3-ZnO Sputtering Target

Superior Purity: 99.99% (4N) purity meets stringent requirements for oxide semiconductors and thin film devices.
High Performance: Excellent electrical conductivity, electron mobility, and optical transparency.
Stable Material: Dense structure, low impurity content, and uniform composition ensure reproducible thin film results.
Flexible Sizes: Available in various dimensions to suit different deposition systems.

Applications of High-Quality IGZO Sputtering Target

Thin Film Transistors (TFTs): Applied in high-performance active-matrix OLEDs and LCD displays.
Flat Panel Displays: Used in backplanes, touch panels, and flexible displays.
Optoelectronic Devices: Suitable for photodetectors, infrared sensors, and transparent electronics.
Research and Development: Widely used in laboratories for material science and device research.
Energy Devices: Applied in transparent conductive films for energy conversion and storage applications.

Why Choose us?

Industry Expertise: Specialized in high-purity oxide semiconductor sputtering targets.
Customized Solutions: Flexible in composition, dimensions, and backing plate selection.
Reliable Quality: Strict impurity control, dense structure, and uniform composition ensure stable performance.
Global Delivery: Fast, secure shipping worldwide with protective packaging.
Technical Support: Professional team provides full technical documentation and consultation.

FAQs

F1. What is the purity of In2O3-Ga2O3-ZnO sputtering targets?
A1. Our IGZO targets have a standard purity of 99.99% (4N), ensuring reliable performance for TFT and thin film applications.

F2. Can the In:Ga:Zn ratio or target size be customized?
A2. Yes, we provide flexible composition ratios and target dimensions according to your deposition system requirements.

F3. How should IGZO targets be stored and handled?
A3. Store in a cool, dry environment in sealed containers. Avoid moisture, dust, and contamination during handling.

F4. What industries use IGZO sputtering targets?
A4. Widely used in TFT backplanes, OLED/LCD displays, touch panels, optoelectronic devices, and research laboratories.

F5. Are technical reports available for industrial or research purposes?
A5. Yes, each batch comes with COA, TDS, MSDS, and ICP-MS impurity reports. Third-party testing reports are available upon request.

Reports

Each batch of products is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports are available upon request to meet industrial and research standards.