| Product ID | Formula | Purity | Dimension | Inquiry |
|---|---|---|---|---|
| 720800ST001 | HfO2 | 99.9% (Zr< 0.5wt%) | Ø 76.2 mm x 3.175 mm | Inquire |
| 720800ST002 | HfO2 | 99.9% (Zr< 0.5wt%) | Ø 76.2 mm x 6.35 mm | Inquire |
| 720800ST003 | HfO2 | 99.9% (Zr< 0.5wt%) | Ø 101.6 mm x 6.35 mm | Inquire |
Hafnium oxide sputtering targets are advanced ceramic materials designed specifically for high-performance thin film deposition processes. Their extremely high purity and dense structure ensure uniform and stable thin film deposition, excellent adhesion, and extremely low impurity content, meeting the stringent requirements of the semiconductor and optoelectronics industries.
We offer a variety of Hafnium oxide sputtering targets in various sizes and shapes, customizable to meet specific customer needs. We also provide comprehensive after-sales support to ensure worry-free use.
Purity: 99.9%
High density ensures uniform thin film deposition
Customizable size, shape, and packaging
Target bonding services available
Suitable for semiconductors, high-k dielectric constant films, optical coatings, and other applications
Semiconductors: As a high-κ dielectric material, it is widely used in gate dielectric layers of next-generation integrated circuits, improving device performance and stability.
Optoelectronics: Used in the fabrication of optical thin films with high transmittance and high refractive index.
Memory devices: Used for thin film deposition in non-volatile memory applications.
Optical coatings: Used for the deposition of high-performance functional films in lenses, displays, and laser devices.
We provide a complete Certificate of Analysis (COA), Material Safety Data Sheet (MSDS), and other relevant technical reports for each batch of HfO₂ sputtering targets. We support third-party testing to ensure product quality meets international standards and customer requirements.
Molecular Formula: HfO₂
Molecular Weight: 210.49 g/mol
Appearance: White, dense ceramic target with a smooth surface
Density: Approximately 9.68 g/cm³ (close to theoretical density)
Melting Point: Approximately 2,758 °C
Crystal Structure: Monoclinic, Tetragonal, or Cubic
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
