ULPMAT

Hafnium Nitride

Chemical Name:
Hafnium Nitride
Formula:
HfN
Product No.:
720700
CAS No.:
25817-87-2
EINECS No.:
247-282-3
Form:
Sputtering Target
HazMat:
Product ID Formula Purity Dimension Inquiry
720700ST001 HfN 99.5% (Hf+Zr) Ø 50.8 mm x 3.175 mm Inquire
720700ST002 HfN 99.5% (Hf+Zr) Ø 76.2 mm x 3.175 mm Inquire
Product ID
720700ST001
Formula
HfN
Purity
99.5% (Hf+Zr)
Dimension
Ø 50.8 mm x 3.175 mm
Product ID
720700ST002
Formula
HfN
Purity
99.5% (Hf+Zr)
Dimension
Ø 76.2 mm x 3.175 mm

Hafnium Nitride sputtering targets Overview

Hafnium Nitride sputtering targets are advanced ceramic targets designed specifically for high-performance thin film deposition processes. Their high purity and excellent density ensure uniform, stable thin film deposition, superior adhesion, and extremely low impurity content, meeting the demands of electronics, optics, and protective coatings.

We offer Hafnium Nitride sputtering targets in a variety of sizes and shapes, customizable to meet specific customer requirements. We also provide comprehensive after-sales technical support to ensure prompt answers to any questions you may have during use.

Product Highlights

Purity: 99.5%
High density ensures uniform thin film deposition
Customizable sizes and shapes
Target bonding available
Suitable for semiconductor devices, optical coatings, and wear-resistant protective films

Applications of Hafnium Nitride sputtering target

Semiconductors: Used for high-temperature, high-frequency, and protective coating deposition, improving device performance and durability.
Optical Coatings: Form protective films with high hardness, high refractive index, and wear resistance.
Protective Coatings: Used for surface hardening of cutting tools, mechanical parts, and other applications, enhancing wear resistance and corrosion resistance.
Functional Thin Films: Used for thin film deposition in microelectronic devices and specialized optical components.

Reports

We provide a complete Certificate of Analysis (COA), Material Safety Data Sheet (MSDS), and related technical reports for each batch of HfN sputtering targets. We also support third-party testing to ensure product quality meets international standards and customer requirements.

Molecular Formula: HfN
Molecular Weight: Approximately 195.63 g/mol
Appearance: Dark gray, dense ceramic target with a smooth surface
Density: Approximately 12.7 g/cm³ (close to theoretical density)
Melting Point: Approximately 3,500°C (high melting point)
Crystal Structure: Cubic sodium chloride structure (NaCl type)

Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.

Outer Packaging: Cartons or wooden crates selected based on size and weight.

SKU 720700ST Category Brand:

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