ULPMAT

Hafnium Boride

Chemical Name:
Hafnium Boride
Formula:
HfB2
Product No.:
720500
CAS No.:
12007-23-7
EINECS No.:
234-500-7
Form:
Sputtering Target
HazMat:
Product ID Formula Purity Dimension Inquiry
720500ST001 HfB2 99.5% (Hf+Zr) Ø 50.8 mm x 3.175 mm Inquire
720500ST002 HfB2 99.5% (Hf+Zr) Ø 76.2 mm x 3.175 mm Inquire
720500ST003 HfB2 99.5% (Hf+Zr) Ø 76.2 mm x 6.35 mm Inquire
720500ST004 HfB2 99.5% (Hf+Zr) Ø 101.6 mm x 6.35 mm Inquire
Product ID
720500ST001
Formula
HfB2
Purity
99.5% (Hf+Zr)
Dimension
Ø 50.8 mm x 3.175 mm
Product ID
720500ST002
Formula
HfB2
Purity
99.5% (Hf+Zr)
Dimension
Ø 76.2 mm x 3.175 mm
Product ID
720500ST003
Formula
HfB2
Purity
99.5% (Hf+Zr)
Dimension
Ø 76.2 mm x 6.35 mm
Product ID
720500ST004
Formula
HfB2
Purity
99.5% (Hf+Zr)
Dimension
Ø 101.6 mm x 6.35 mm

Hafnium Boride sputtering targets Overview

Hafnium Boride sputtering targets are high-performance materials designed specifically for thin film deposition processes. With a purity of 99.5%, they offer excellent density and hardness, ensuring uniform thin film deposition and strong adhesion, making them suitable for a variety of high-temperature and high-pressure environments.

We offer Hafnium Boride sputtering targets in a variety of shapes and sizes, including round, rectangular, and custom sizes, to meet the specific needs of our customers. We also provide comprehensive after-sales support; please feel free to contact us if you have any questions.

Product Highlights

Purity: 99.5%
High density ensures uniform thin film deposition
High hardness and strength, suitable for high-temperature and high-pressure environments
Customizable sizes and shapes
Target bonding available
Suitable for semiconductors, optical coatings, aerospace, and other fields

Applications of Hafnium Boride sputtering target

Semiconductors: Due to its excellent conductivity and thermal stability, it is widely used in the deposition of high-power devices and optoelectronic materials.
Optical Coatings: Used to form high-hardness, high-reflectivity thin films, it is particularly suitable for applications such as optical components and mirrors. Aerospace: HfB₂’s high melting point and high-temperature resistance make it an outstanding choice for aerospace applications, making it suitable for high-temperature protection and thermal shielding materials.
Electrical and Energy: It is suitable for the deposition of high-power electronic devices, solar thin films, and other high-performance functional films.

Reports

We provide a Certificate of Analysis (COA), Material Safety Data Sheet (MSDS), and other relevant reports with each shipment. We also support third-party testing to ensure product quality and reliability.

Molecular Formula: HfB₂
Molecular Weight: 190.08 g/mol
Appearance: A hard material with a silvery-gray metallic luster
Density: Approximately 10.5 g/cm³ (close to theoretical density)
Melting Point: Approximately 3,250°C
Crystal Structure: Hexagonal

Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.

Outer Packaging: Cartons or wooden crates selected based on size and weight.

SKU 720500ST Category Brand:

Documents

No PDF files found.

Contact Us

If you need any service, please contact us

More Information

more products

CONTACT US

Thermal Spray

Our website has been completely upgraded