Gallium Tin Oxide composite sputtering targets are functional ceramic targets prepared by combining gallium oxide (Ga₂O₃), a wide-bandgap semiconductor material, with tin oxide (SnO₂), a transparent conductive oxide material, in a specific ratio. Through doping or composite processing, it aims to integrate Ga₂O₃’s high breakdown voltage characteristics with SnO₂’s conductivity. This material is suitable for depositing composite oxide films with specific optoelectronic properties, exploring applications in novel transparent electronics, deep ultraviolet optoelectronic devices, and high-performance gas sensors.
We can customize composite ceramic sputtering targets with varying Ga2O3:SnO2 ratios (e.g., molar or weight ratios) and high purity (≥99.9%) to meet your research or development requirements. Standard circular or rectangular target sizes are available, along with professional bonding services. Contact us to discuss specific composition solutions, obtain quotes, or request technical documentation.
Flexible composition customization
High purity and high density
Combines properties of two wide-bandgap materials
Excellent potential for film uniformity
Professional bonding services available
Transparent Electronics & Displays: Deposits transparent conductive films (TCO) for novel display touch electrodes or energy-efficient windows.
Deep UV Optoelectronics: Used for transparent electrodes and functional layers in day-blind UV detectors or LEDs to enhance device performance.
High-Performance Gas Sensors: Leveraging the composite material’s surface activity to develop highly sensitive, selective gas sensors (e.g., O₂, CO).
Protective & Functional Coatings: Serves as wear-resistant, corrosion-resistant functional protective coatings for components in harsh environments.
Q1: What are the advantages of this composite target material compared to pure gallium oxide targets?
A1: The primary advantage lies in tunable electrical and optical properties. Introducing SnO₂ can significantly improve film conductivity, expanding applications in transparent electrodes and other fields.
Q2: How to determine the appropriate Ga₂O₃ and SnO₂ ratio?
A2: This depends on the target film properties. Increasing the SnO₂ ratio enhances conductivity, while raising the Ga₂O₃ ratio improves breakdown voltage and UV resistance. Experimental optimization is typically required.
Q3: Is this material safe?
A3: The solid-state target itself is stable. However, standard chemical dust precautions should be followed during powder handling and preparation to prevent inhalation.
Q4: How should the target be stored and maintained?
A4: Store in a sealed, moisture-proof container in a dry environment. As it is ceramic material, avoid impacts during handling. Clean the target surface after use.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports available upon request
We specialize in the customized development of wide bandgap semiconductor materials, providing professional technical solutions to support your cutting-edge exploration and innovative applications.
Chemical formula: Ga₂O₃–SnO₂ (ratio can be customized)
Appearance: White to light gray ceramic sputtering target
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
