Gallium selenide sputtering targets are functional ceramic targets prepared from high-purity GaSe powder or ingots through advanced powder metallurgy processes. Inheriting the unique layered crystal structure, direct bandgap, and outstanding nonlinear optical properties of GaSe material, it serves as the core source material for producing high-quality gallium selenide films via physical vapor deposition (PVD) technology. It is primarily applied in advanced infrared optoelectronics, nonlinear optics, and novel two-dimensional material devices.
We offer high-quality GaSe ceramic sputtering targets in multiple purities, dimensions, and bonding configurations. Contact us for technical documentation.
Layered semiconductor structure
Superior nonlinear optical performance
Optimized characteristics for mid-to-far infrared applications
High purity with precise stoichiometry
Professional backing plate bonding available
Infrared and Nonlinear Optical Devices: Used for thin-film deposition in manufacturing core functional components for terahertz generation/detection and mid-infrared laser frequency doubling.
Optoelectronics and Detectors: Used to fabricate high-performance infrared photodetectors, field-effect transistors, and sensitive layers for flexible optoelectronic devices.
Frontier 2D Materials and Devices: Serves as a deposition source for high-quality 2D GaSe films, enabling fundamental research and application development for novel quantum devices and sensors.
Specialized Functional Coatings: Leveraging its unique optical and semiconductor properties, deposited as functional films for infrared windows or specialized sensors.
Q1: Why choose GaSe target material?
A1: Its core advantages lie in its unique layered structure and outstanding nonlinear optical properties, making it particularly suitable for manufacturing mid-infrared and terahertz-band optoelectronic devices.
Q2: What purity requirements apply to GaSe target material?
A2: To ensure optimal thin-film optoelectronic performance, purity must typically exceed 99.9%. High purity effectively minimizes defects caused by impurities.
Q3: What precautions should be taken during use and maintenance?
A3: This material is brittle and requires careful handling during placement and removal. Store in sealed containers to prevent moisture exposure. Due to its layered structure, sputtering process parameters must be optimized to achieve uniform thin films.
Q4: Can non-standard dimensions or bonding be customized?
A4: Yes. We support customizing target shapes and sizes based on your equipment chamber and process requirements, and provide professional backing plate bonding services.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports available upon request
Leveraging our expertise in specialty compound targets, we deliver highly stable, consistent GaSe targets and customized solutions.
Molecular Formula: GaSe
Molecular Weight: 144.72 g/mol
Appearance: Dark gray to dark gray dense target material
Density: 5.32 g/cm³
Melting Point: Approximately 950 °C
Crystal Structure: Hexagonal
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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