Gallium Iron Oxide is a multiferroic functional ceramic material exhibiting unique magnetoelectric coupling properties, where its magnetic properties can be controlled by electric fields and its electrical properties by magnetic fields. This target material is primarily used in magnetron sputtering processes to deposit high-quality GaFeO₃ thin films. Such films hold significant application potential in next-generation multifunctional sensors, non-volatile memory, and spintronic devices.
We offer high-purity, high-density ferrite gallium ceramic sputtering targets in multiple standard sizes with customization options. Contact us for tailored solutions.
High Purity
Precise stoichiometric ratios
High density with low porosity
Excellent microstructural uniformity
Professional backing plate bonding services
Advanced Sensors: Leveraging its magnetoelectric coupling effect to fabricate highly sensitive magnetic or electric field sensors.
Information Storage: Used in developing novel multiphase non-volatile memory and spintronic logic devices.
Integrated Optical and Microwave Devices: Deposited optical waveguide films for optical communications and tunable microwave devices.
Frontier Scientific Research: Serves as a critical thin-film material for fundamental and applied studies in ferroelectric physics and heterojunction devices.
Q1: What are the core advantages of GaFeO3 targets?
A1: Their core value lies in ferroelectricity and magnetoelectric coupling, enabling dual regulation and conversion of electrical and magnetic signals.
Q2: What purity requirements apply to this ceramic target?
A2: High purity is essential. Film performance is sensitive to impurities; we provide products exceeding 99.9% purity to ensure performance.
Q3: How should the target be stored and maintained?
A3: Store in a sealed, moisture-proof container within a dry environment. Handle with care due to its brittle nature to prevent cracking from impacts.
Q4: Is pre-sputtering required before use?
A4: Yes. Pre-sputtering cleans the target surface, removing potential oxides or contaminants to ensure pure film composition and stable deposition.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports available upon request
We specialize in delivering high-performance specialty ceramic targets, backed by expert technical support to ensure your success in cutting-edge functional film R&D.
Molecular Formula: GaFeO₃
Molecular Weight: 187.88 g/mol
Appearance: Brown to dark brown ceramic target
Density: Approx. 5.2 g/cm³
Melting Point: Approx. 1,500 °C (softens before decomposition)
Crystal Structure: Orthorhombic
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
