Fluorine doped Tin Oxide (FTO)

Fluorine doped tin oxide sputtering targets Overview

Fluorine doped tin oxide sputtering targets are high-performance materials designed specifically for conductive, transparent thin film deposition processes, suitable for the manufacture of a variety of optoelectronic devices. Their precisely controlled composition and high purity provide excellent density, conductivity, and transparency, enabling uniform film formation, good adhesion, and superior optoelectronic performance.

We offer Fluorine doped tin oxide sputtering targets in a variety of shapes and sizes, including round and rectangular shapes, and can customize them to meet specific customer needs. We also provide professional technical support and comprehensive after-sales service to ensure stable process operation.

Product Highlights

Purity: 99.99%
Excellent conductivity and light transmittance
High density, uniform film formation, and good adhesion
Customizable size, doping concentration, and shape
Target bonding available
Compatible with low-temperature or high-temperature sputtering systems

Applications of Fluorine doped tin oxide sputtering target

Solar cells: Used as transparent conductive electrodes in dye-sensitized solar cells and perovskite solar cells.
Flat panel displays: Used as transparent electrodes in display panels such as LCDs and OLEDs. Optoelectronic Devices: Used in transparent conductive thin film devices such as photodetectors, photoelectric sensors, and smart windows.
Touch Panels: Used as a transparent electrode layer in touch screens as an alternative to ITO.

Reports

We provide a Certificate of Analysis (COA), Material Safety Data Sheet (MSDS), and related technical reports with each batch of FTO sputtering targets. Third-party testing reports are available upon request to ensure material quality meets industry standards.