| Product ID | Formula | Purity | Dimension | Inquiry |
|---|---|---|---|---|
| 680800ST001 | Er2O3 | 99.95% (REO) | Ø 50.8 mm x 3.175 mm | Inquire |
| 680800ST002 | Er2O3 | 99.95% (REO) | Ø 76.2 mm x 3.175 mm | Inquire |
| 680800ST003 | Er2O3 | 99.99% (REO) | Ø 76.2 mm x 6.35 mm | Inquire |
| 680800ST004 | Er2O3 | 99.99% (REO) | Ø 101.6 mm x 6.35 mm | Inquire |
| 680800ST005 | Er2O3 | 99.99% (REO) | Ø 203.2 mm x 6.35 mm | Inquire |
Erbium oxide sputtering targets are advanced ceramic materials designed for high-performance thin film applications and are widely used in optical devices, infrared windows, laser gain media, dielectric film layers, and other technical fields. Its high purity (up to 99.99%) and density enable it to exhibit excellent film uniformity and stability in thin film deposition processes such as magnetron sputtering and electron beam evaporation.
We can provide Erbium oxide sputtering targets in various sizes and shapes, including round, rectangular, and flat composite targets, and support on-demand customization. Our professional team provides full technical support and after-sales service to every customer. Whether you need high-purity Erbium oxide sputtering targets for optical coatings, or Erbium oxide targets for advanced thin film deposition, we are committed to delivering the best solutions tailored to your needs.
Purity: 99.99%
High density: ensure excellent film-forming performance and low sputtering foreign matter
Customized support: size, structure, backplane, etc. can be designed on demand
Applicable processes: magnetron sputtering, pulsed laser deposition, electron beam evaporation, etc.
Binding service: available and customizable
Optical coating: used for high-end optical structures such as infrared windows, high refractive films, and filter devices
Semiconductor industry: can be used to prepare high dielectric constant layers and rare earth doped layers
Laser and optical communication: as thin film materials related to laser working materials (such as Er:YAG, Er:SiO₂)
Energy and environmental materials: used in electroluminescent devices and thermal energy conversion film research
We provide Certificate of Analysis (COA), Material Safety Data Sheet (MSDS) and other relevant reports for each batch of Erbium oxide sputtering targets. In addition, we also support third-party testing to enhance quality assurance.
Molecular formula: Er₂O₃
Appearance: Light pink or light purple dense ceramic target, with smooth surface
Density: about 8.6 g/cm³ (close to theoretical density)
Melting point: about 2,430°C
Conductivity: electrical insulator (high resistivity, suitable for dielectric film applications)
Crystal structure: cubic crystal system
Magnetic properties: paramagnetic, weak magnetic response at low temperature
Chemical stability: stable in room temperature dry environment and inert atmosphere, good moisture resistance
Signal Word:
None
Hazard Statements:
None
Inner packaging: Vacuum-sealed bag to protect against contamination and moisture.
Outer packaging: Carton or wooden box, depending on size and weight.
Fragile targets: Special protective packaging is used to ensure safe transport.
If you need any service, please contact us
