Cuprous oxide sputtering targets are high-purity functional material targets primarily used in thin film deposition and electronic device manufacturing to ensure film stability and reliable performance.
We can provide high-purity cuprous oxide sputtering targets in various specifications and sizes to meet customer needs. Contact us for customized solutions.
High-purity copper (I) oxide
Excellent compositional uniformity
Stable film deposition
Low impurity content
Compatible with various sputtering equipment
Stable electrical and optical properties
Supports round, square, and irregular shapes
Semiconductor and Electronic Device Thin Film Preparation: Suitable for the preparation and deposition of P-type semiconductor materials, ensuring device electronic performance and long-term reliability.
Optoelectronics and Display Devices: Used in conductive or functional thin films for optoelectronic components and displays, providing uniform film layers and stable performance.
Functional Coatings and Industrial Films: Used for corrosion-resistant, conductive, or special functional coating deposition, enhancing the performance and added value of industrial materials.
Q1: Is cuprous oxide a suitable sputtering target for DC or RF sputtering?
A1: Cuprous oxide is a semiconductor material, and RF sputtering is generally recommended to ensure stable deposition and film quality.
Q2: Does the target surface require special treatment?
A2: Shipped targets are usually polished and deoxidized at the factory and can be used directly. Further pretreatment can be performed as needed depending on the process.
Q3: Is cuprous oxide a target fragile?
A3: Compared to metal targets, cuprous oxide targets are more brittle. Care should be taken to prevent impact damage during handling and installation.
Q4: Can the target shape be customized according to equipment size?
A4: Yes, we offer round, square, and special shapes to suit different sputtering equipment and process requirements.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports available upon request
Qualitative analysis provides reliable and traceable cuprous oxide sputtering targets for scientific research, industrial and electronic device thin film preparation, ensuring high-quality and long-term consistency of film deposition.
Chemical Formula: Cu₂O
Molecular Weight: 143.09 g/mol
Appearance: Red to reddish-brown dense target material
Density: 6.0 g/cm³
Melting Point: 1,232 °C (decomposes)
Crystal Structure: Cubic (Cubic, Cuprite structure)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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