Copper telluride sputtering targets are high-purity functional material targets suitable for thin film deposition and optoelectronic and semiconductor device manufacturing, ensuring film uniformity and performance stability.
We can provide copper telluride sputtering targets in various specifications, high purity, and custom shapes according to customer equipment and process requirements. Please contact us for technical support and samples.
High purity
High compositional uniformity
Stable film deposition performance
Low impurity content
Compatible with various sputtering equipment
Reliable conductivity and optical properties
Supports custom circular, square, and irregular shapes and bonding
Optoelectronic Thin Film Preparation: Suitable for solar cell and photoconductive thin film deposition, providing uniform film layers and stable optoelectronic performance.
Semiconductor Device Manufacturing: As a p-type semiconductor target, used in the research and development of new electronic devices and functional material systems, ensuring stable device performance.
Functional Coatings and Industrial Films: Can be used for conductive, corrosion-resistant, and special functional coating deposition, improving the lifespan and performance of industrial materials.
Q1: Which sputtering method is suitable for copper telluride targets?
A1: Copper telluride is a semiconductor material, and RF sputtering is generally recommended to ensure uniform film and stable deposition.
Q2: Does the target require pretreatment?
A2: The targets are polished and deoxidized at the factory and can be used directly. Additional pretreatment can be performed as needed depending on the process.
Q3: Are targets fragile during sputtering?
A3: Compared to metal targets, copper telluride targets are more brittle. Avoid collisions during handling and installation.
Q4: Can target sizes and shapes be customized?
A4: Yes, we offer round, square, and custom-shaped targets to meet different equipment and process requirements.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports available upon request
We focus on the production and supply of high-purity functional material sputtering targets. From raw material selection to batch control, we strictly control the process to ensure that copper telluride targets have stable and reliable performance in scientific research, industry and optoelectronic device thin film preparation, and provide customers with traceable high-quality materials.
Chemical Formula: Cu₂Te
Molecular Weight: 223.30 g/mol
Appearance: Black to dark gray dense target material
Density: 7.35 g/cm³
Melting Point: 1,065 °C
Crystal Structure: Hexagonal
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
