Copper sulfide sputtering targets are high-purity functional material targets widely used in thin film deposition, optoelectronic devices, and electronic material fabrication.
We can provide high-purity copper sulfide targets in various specifications and sizes according to customer equipment and process requirements. Please contact us for customized solutions.
High purity
High compositional uniformity
Stable and reliable film deposition
Low impurity content
Compatible with various sputtering equipment
Stable electrical and optical properties
Supports custom circular, square, and irregular shapes and bonding
Optoelectronic Thin Film Fabrication: Used for solar cell and photoconductive thin film deposition, ensuring film uniformity and photoelectric conversion performance.
Semiconductor Device Manufacturing: As a functional semiconductor material target, it can be used to develop new electronic devices, ensuring stable electronic performance.
Functional Coatings and Industrial Applications: Used for corrosion-resistant, conductive, or special functional coating deposition, increasing the added value of industrial materials.
Q1: Is copper sulfide target suitable for DC or RF sputtering?
A1: Copper sulfide is a semiconductor material, and radio frequency sputtering is recommended to achieve stable film deposition results.
Q2: Does the target require surface treatment?
A2: Targets are usually polished and deoxidized before use. Pre-treatment can be performed according to process requirements if necessary.
Q3: Is the target fragile during sputtering?
A3: Compared to metal targets, copper sulfide targets are more brittle. Care must be taken during handling and installation to avoid collisions.
Q4: Can target sizes and shapes be customized?
A4: Yes, we offer round, square, and custom-shaped targets to meet different equipment and process requirements.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports available upon request
We specialize in the production and supply of high-purity functional material sputtering targets. From raw material selection to batch control, we strictly control the process to ensure the stable performance of copper sulfide targets in scientific research, industrial applications, and electronic device thin film preparation. We provide customers with reliable, traceable, high-quality materials.
Chemical Formula: Cu₂S
Molecular Weight: 159.16 g/mol
Appearance: Black to dark brown dense target material
Density: 5.61 g/cm³
Crystal Structure: Monoclinic
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
