ULPMAT

Copper Selenide

Chemical Name:
Copper Selenide
Formula:
CuSe
Product No.:
293401
CAS No.:
1317-41-5
EINECS No.:
215-272-8
Form:
Sputtering Target
HazMat:
Product ID Formula Purity Dimension Inquiry
293401ST001 CuSe 99.99% Ø 50.8 mm x 6.35 mm Inquire
293401ST002 CuSe 99.99% Ø 76.2 mm x 6.35 mm Inquire
293401ST003 CuSe 99.99% Ø 101.6 mm x 3.175 mm Inquire
Product ID
293401ST001
Formula
CuSe
Purity
99.99%
Dimension
Ø 50.8 mm x 6.35 mm
Product ID
293401ST002
Formula
CuSe
Purity
99.99%
Dimension
Ø 76.2 mm x 6.35 mm
Product ID
293401ST003
Formula
CuSe
Purity
99.99%
Dimension
Ø 101.6 mm x 3.175 mm

Copper Selenide Sputtering Targets Overview

Copper selenide sputtering targets are functional materials used for thin film deposition, primarily in optoelectronic devices, conductive thin films, and materials research.

We offer copper selenide sputtering targets with uniform composition and high density, supporting customization in various sizes and structures. Please contact us for technical data and sample information.

Product Highlights

Uniform and stable composition
Dense and uniform target material
Smooth sputtering process
Controllable thin film composition
Fine surface finish
Optional bonding and backplane options
Suitable for various equipment

Applications of Copper Selenide Sputtering Targets

Optoelectronic Device Thin Film Preparation: Can be used to deposit thin films with stable conductivity and semiconductor properties, meeting the R&D needs of photovoltaic devices and electronic devices.
Functional Thin Films and Surface Coatings: Forms thin film coatings with good adhesion, uniformity, and stability through sputtering processes for surface functionalization.
Sensor and Electronic Device Research: Suitable for scenarios in sensor and electronic device R&D where high consistency of thin film composition and performance stability are required.
Materials Processing and Performance Research: Widely used in research institutions to explore the relationship between thin film structure, deposition conditions, and performance.

FAQs

Q1: Which sputtering methods are suitable for copper selenide sputtering targets?
A1: They can be used for common sputtering methods such as DC and RF sputtering. Specific selection depends on equipment conditions.

Q2: Does target density affect film quality?
A2: High density helps improve sputtering uniformity and film composition consistency.

Q3: Can targets of different sizes or shapes be customized?
A3: Custom targets of various sizes, thicknesses, and shapes can be provided according to equipment requirements.

Q4: What precautions should be taken during target storage and transportation?
A4: Sealed storage is recommended to avoid moisture and contamination, in order to maintain surface condition and performance.

Reports

Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports available upon request

Why Choose Us?

We focus on the production and quality management of metal selenide sputtering targets, emphasizing material uniformity, processing accuracy, and delivery stability, to provide reliable and evaluable thin film deposition solutions for research and industrial customers.

Chemical Formula: CuSe
Molecular Weight: 151.61 g/mol
Appearance: Black, dense target material
Density: 6.23 g/cm³
Melting Point: 1,100 °C (before decomposition)
Crystal Structure: Tetragonal

Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.

Outer Packaging: Cartons or wooden crates selected based on size and weight.

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