ULPMAT

Copper Indium Gallium

Chemical Name:
Copper Indium Gallium
Formula:
CuInGa
Product No.:
29493100
CAS No.:
EINECS No.:
Form:
Sputtering Target
HazMat:
Product ID Formula Purity Dimension Inquiry
29493100ST001 CuInGa 99.99% Ø 76.2 mm x 6.35 mm Inquire
29493100ST002 CuInGa 99.99% Ø 152.4 mm x 6.35 mm Inquire
29493100ST003 CuInGa 99.99% Ø 203.2 mm x 6.35 mm Inquire
Product ID
29493100ST001
Formula
CuInGa
Purity
99.99%
Dimension
Ø 76.2 mm x 6.35 mm
Product ID
29493100ST002
Formula
CuInGa
Purity
99.99%
Dimension
Ø 152.4 mm x 6.35 mm
Product ID
29493100ST003
Formula
CuInGa
Purity
99.99%
Dimension
Ø 203.2 mm x 6.35 mm

Copper Indium Gallium Sputtering Target Overview

Copper Indium Gallium sputtering targets are multi-element alloy targets primarily used for preparing tunable composition optoelectronic and functional thin films.

We offer targets with varying copper, indium, and gallium ratios and in various specifications, and support customization based on equipment parameters. Please contact us for technical support.

Product Highlights

Uniform distribution of multi-element components
Precisely designable composition ratios
High target density
Stable sputtering process
Good film repeatability
Good bonding
Suitable for complex thin film structure development

Applications of Copper Indium Gallium Sputtering Target

Thin-film solar material development: This target is commonly used for depositing metal precursor films. By adjusting the element ratios, it provides a foundation for optimizing the performance of subsequent functional layers.
Preparation of optoelectronic functional thin films: Sputtering processes can obtain alloy thin films with uniform composition, suitable for research on the control of optical and electrical properties.
Semiconductor material system research: In the exploration of multi-element semiconductor materials, this material helps to study the influence of different element ratios on band structure.

FAQs

Q1: Can the element ratios be adjusted according to project requirements?
A1: Yes, the target composition can be designed and manufactured according to the requirements of the target thin film.

Q2: Does this target have special requirements for sputtering equipment?
A2: It is compatible with mainstream sputtering systems. Specific parameters need to be optimized based on equipment conditions.

Q3: Is film composition prone to segregation during sputtering?
A3: Under reasonable power and atmosphere control, the film composition maintains good consistency.

Q4: Is the target suitable for long-term continuous sputtering?
A4: The target structure is stable and suitable for continuous deposition and multi-batch process testing.

Report

Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports available upon request

Why Choose Us?

We have mature experience in the preparation and quality management of multi-element alloy sputtering targets. From composition design to finished product testing, we have systematic processes to provide customers with stable and consistent material quality, flexible customization capabilities, and continuous reliable delivery support, helping projects progress efficiently.

Chemical Formula: CuInGa
Appearance: Silver-gray to dark gray dense sputtering target

Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.

Outer Packaging: Cartons or wooden crates selected based on size and weight.

Documents

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