ULPMAT

Copper Germanium Alloy

Chemical Name:
Copper Germanium Alloy
Formula:
CuGe
Product No.:
293200
CAS No.:
EINECS No.:
Form:
Sputtering Target
HazMat:
Product ID Formula Purity Dimension Inquiry
293200ST001 CuGe 99.99% Ø 25.4 mm x 6.35 mm Inquire
Product ID
293200ST001
Formula
CuGe
Purity
99.99%
Dimension
Ø 25.4 mm x 6.35 mm

Copper Germanium Sputtering Target Overview

Copper Germanium sputtering targets are copper germanium alloy targets primarily used for the deposition of functional thin films and semiconductor materials, suitable for processes with precise requirements on film composition and performance.

We offer CuGe sputtering targets with varying copper-germanium ratios and in various sizes, supporting customized processing and technical consultation. Please contact us for detailed solutions.

Product Highlights

Controllable copper-germanium composition ratio
Uniform target density
Stable internal structure
High film deposition uniformity
Stable and reliable sputtering process
Suitable for precise process control
Excellent batch consistency

Applications of CuGe Sputtering Targets

Semiconductor Thin Film Preparation: CuGe targets are used to deposit high-performance copper-germanium thin films, meeting the conductivity and compositional uniformity requirements of semiconductor devices.
Optoelectronic and Photovoltaic Device Research: In optoelectronic materials and photovoltaic thin films, copper-germanium thin films can be tuned for electrical and optical properties, supporting device optimization.
Precursor Layer for Multi-Component Composite Thin Films: CuGe thin films can serve as a base for composite thin films or functional layers, ensuring the uniformity and stability of subsequent processes.
Process Development and Experimental Validation: Suitable for laboratory and pilot-scale stages, verifying the impact of different sputtering parameters on thin film structure and performance.

FAQs

Q1: Which sputtering methods are suitable for CuGe sputtering targets?
A1: Generally suitable for magnetron sputtering, and can also be used under specific DC sputtering conditions. Specific solutions depend on equipment conditions.

Q2: Does the copper-germanium ratio significantly affect thin film performance?
A2: The impact is significant. Different component ratios directly affect the electrical, structural, and optical properties of the thin film.

Q3: What is the role of target density in sputtering stability?
A3: Higher density helps reduce particle generation and improves the consistency of thin film deposition.

Q4: Precautions for storing CuGe targets?
A4: It is recommended to store in a sealed, dry environment, avoiding moisture and surface contamination to ensure sputtering performance.

Reports

Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports available upon request

Why Choose Us?

We have extensive experience in the preparation and quality control of copper-based alloy sputtering targets. We strictly manage the composition ratio and internal structure to ensure the compositional uniformity and stability of CuGe targets in thin film deposition, providing reliable material support for scientific research and industrial applications.

Chemical Formula: CuGe

Appearance: Dense sputtering target, silver-gray to metallic gray

Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.

Outer Packaging: Cartons or wooden crates selected based on size and weight.

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