ULPMAT

Copper Gallium Alloy

Chemical Name:
Copper Gallium Alloy
Formula:
CuGa
Product No.:
293100
CAS No.:
EINECS No.:
Form:
Sputtering Target
HazMat:
Product ID Formula Purity Dimension Inquiry
293100ST001 CuGa (80:20 wt%) 99.9% Ø 25.4 mm x 6.35 mm Inquire
Product ID
293100ST001
Formula
CuGa (80:20 wt%)
Purity
99.9%
Dimension
Ø 25.4 mm x 6.35 mm

Copper Gallium Sputtering Target Overview

Copper Gallium sputtering targets are copper-gallium alloy targets commonly used in functional thin film and semiconductor deposition applications requiring precise composition control.

We offer CuGa sputtering targets in various composition ratios and sizes, and support customized processing and technical communication. Please contact us for customized solutions.

Product Highlights

Controllable copper-gallium alloy ratio
Good target density
Uniform alloy microstructure
Stable sputtering process
High film composition consistency
Suitable for fine process windows
Reliable batch repeatability

Applications of CuGa Sputtering Targets

Semiconductor Functional Thin Film Deposition: CuGa targets can be used to prepare metal or alloy thin film systems with high requirements for composition ratios.
Optoelectronics and Related Device Research: In the development of optoelectronic materials and devices, copper-gallium thin films are often used to control electrical and optical responses.
Precursor Layer for Multi-component Compound Thin Films: CuGa alloy thin films can serve as the base layer material for subsequent reactions or composite thin film preparation.
Process Development and Experimental Validation: Suitable for laboratory and pilot-scale use to verify the impact of different sputtering parameters on thin film performance.

FAQs

Q1: Are there high requirements for composition control when using CuGa sputtering targets?
A1: Yes, the copper to gallium ratio directly affects the film composition, making target composition control crucial.

Q2: Is this target suitable for DC or magnetron sputtering?
A2: It is generally suitable for magnetron sputtering; the specific method needs to be determined based on equipment conditions and process requirements.

Q3: Does target uniformity affect film consistency?
A3: Yes, uniform internal structure helps obtain deposited films with stable compositional distribution.

Q4: What precautions should be taken when storing CuGa targets?
A4: It is recommended to store them in sealed containers and avoid high humidity environments to reduce the risk of surface changes.

Reports

Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports available upon request

Why Choose Us?

We have extensive experience in the preparation and quality control of alloy sputtering targets, and can stably control the composition ratio and internal structure of CuGa targets to provide customers with reliable sputtering performance and transparent parameters.

Chemical Formula: CuGa

Appearance: Dense target material, silver-gray to metallic gray

Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.

Outer Packaging: Cartons or wooden crates selected based on size and weight.

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