Copper chromium sputtering targets are alloy targets that balance conductivity and heat resistance, primarily used in physical vapor deposition processes for electronic devices and functional thin films.
We offer sputtering targets with varying copper-chromium ratios and in various sizes, supporting customized processing and technical collaboration. Please contact us for detailed solutions.
Uniform alloy composition distribution
Stable conductivity
High temperature and sputtering resistance
High target surface density
Good film adhesion
Compatible with various sputtering systems
Supports round, rectangular, and irregular shapes
Semiconductor Interconnects and Functional Thin Films: Used for depositing conductive or functional metal films to meet the stability and consistency requirements of integrated circuits.
Electrical Contacts and Wear-Resistant Coatings: Used in electrical contact materials and wear-resistant films, balancing conductivity and lifespan.
Industrial Protection and Functional Coatings: Suitable for preparing heat-resistant, corrosion-resistant, or composite functional thin films, improving the surface properties of industrial components.
Scientific Research and Thin Film Processing: Widely used in the study of novel alloy thin films and material properties, ensuring experimental repeatability and film controllability.
Q1: What are the advantages of CuCr targets compared to pure copper targets?
A1: Adding chromium significantly improves heat resistance and anti-migration ability, making the film more stable under high-temperature conditions.
Q2: Is this alloy target suitable for DC or RF sputtering?
A2: Due to the good conductivity of the alloy, DC sputtering is usually sufficient to achieve stable deposition results.
Q3: Does the copper-chromium ratio affect film performance?
A3: Yes, different component ratios will affect film resistivity, hardness, and heat resistance. The appropriate ratio should be selected based on the application.
Q4: Does the target require pretreatment before use?
A4: Generally, no complex treatment is needed; simple cleaning is sufficient. For first-time use, a short pre-sputtering time can be performed to stabilize the target surface.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports available upon request
We have long focused on the production and quality control of alloy sputtering targets. From raw material proportioning to target densification processes, we strictly manage all aspects to ensure that our copper chromium alloy targets meet the needs of scientific research and industrial applications in terms of film consistency, stability, and batch reliability.
Chemical Formula: CuCr
Appearance: Dense target material, Yellow target material
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
