Cobalt sputtering targets possess excellent conductivity and high-temperature stability, making them widely used in the fabrication of electronic, thin-film, and optoelectronic materials.
We offer high-purity Cobalt metal sputtering targets to meet various thin-film deposition needs. Contact us for customized solutions.
High purity ensures stable sputtering performance.
Good conductivity, suitable for efficient thin-film deposition.
Strong high-temperature stability, suitable for high-temperature environments.
High density ensures uniform sputtering effect.
Customizable sizes to meet different equipment requirements.
Strict quality control guarantees product consistency and high performance.
Semiconductor Manufacturing: Cobalt metal sputtering targets are key materials for manufacturing thin films and integrated circuits, widely used in the semiconductor industry.
Optoelectronics Industry: In the production of optoelectronic devices, Cobalt metal targets are used for thin-film deposition, providing excellent electrical and optical properties.
Solar Cells: Photovoltaic thin-film deposition used in solar cells helps improve photoelectric conversion efficiency.
Magnetic Materials: As a material for high-performance magnetic thin films, Cobalt metal targets have wide applications in magnetic storage and sensors.
Q1: What is the purity of Cobalt metal targets?
A1: Our Cobalt metal targets achieve a purity of 99.95%, ensuring stability in high-precision deposition.
Q2: What equipment are Cobalt metal targets suitable for?
A2: Cobalt metal targets are widely used in magnetron sputtering equipment, sputtering coating equipment, and other thin-film deposition equipment.
Q3: Can Cobalt metal targets be customized in size?
A3: Yes, we can provide Cobalt metal targets in customized sizes according to customer requirements.
Q4: What is the lifespan of Cobalt metal targets?
A4: The lifespan of Cobalt metal targets depends on the operating environment and deposition conditions, but under normal conditions, a long service life can be guaranteed.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports available upon request
Our Cobalt metal sputtering targets offer high purity, stability, and excellent sputtering performance. Combined with customized services and professional after-sales support, we are the ideal choice for long-term cooperation.
Molecular Formula: Co
Molecular Weight: 58.93 g/mol
Appearance: Silver-gray metallic
Density: 8.90 g/cm³ (theoretical density, 20 ℃)
Melting Point: 1495 ℃
Boiling Point: 2927 ℃
Crystal Structure: Hexagonal close-packed structure
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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