Cobalt Silicide sputtering targets are high-purity cobalt silicide targets with excellent conductivity and thermal stability, widely used in semiconductor thin film, microelectronic device, and high-temperature conductive layer deposition.
We offer CoSi2 sputtering targets in various sizes, crystal forms, and purity grades, and support sample testing and technical consultation. Please contact us for detailed information and process solutions.
Dense and uniform crystal structure
Stable conductivity
Excellent thermal stability
Corrosion and wear resistance
Suitable for various sputtering processes
Customizable size and crystal form
Customizable backplane and bonding
Supports scientific research experiments and process verification
Semiconductor Thin Film Preparation: Cobalt Silicide targets are suitable for semiconductor thin film deposition, ensuring dense and uniform films and improving device conductivity.
Microelectronic Device Deposition: Used for metallization layer deposition in microelectronic devices, improving device performance stability and reliability.
High-Temperature Conductive Layers: Conductive thin films can be deposited at high temperatures, exhibiting good thermal stability and conductivity.
Research and Materials Development: Widely used in research institutions and corporate R&D departments for material performance testing and process parameter optimization.
Q1: What sputtering methods is Cobalt Silicide sputtering target suitable for?
A1: It can be used in thin film processes such as magnetron sputtering, RF sputtering, and chemical vapor deposition to meet the needs of microelectronic deposition.
Q2: Can the target crystal form be customized?
A2: Yes, we can provide different crystal forms of targets according to customer needs to optimize thin film performance.
Q3: Is the target prone to cracking during sputtering?
A3: Prepared using a high-density metallurgical process, the grains are uniform, which effectively reduces the risk of cracks and voids.
Q4: What precautions should be taken when storing the target?
A4: It is recommended to store it in a sealed, dry, and ventilated environment, avoiding moisture and contamination to maintain performance stability.
Each batch is supplied with:
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We specialize in the R&D and stable supply of high-purity cobalt silicide sputtering targets. With a mature quality management system and flexible customization capabilities, we can provide customers with reliable, traceable target solutions suitable for scientific research and industrial applications, helping projects progress efficiently.
Molecular Formula: CoSi₂
Molecular Weight: 115.11 g/mol
Appearance: Silver-gray to black
Density: 6.00 g/cm³
Melting Point: 1,400 ℃
Crystal Structure: Face-centered cubic
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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