ULPMAT

Cobalt Silicide

Chemical Name:
Cobalt Silicide
Formula:
CoSi2
Product No.:
271400
CAS No.:
12017-12-8
EINECS No.:
234-616-8
Form:
Powder
HazMat:
Product ID Formula Purity Dimension Inquiry
271400PD001 CoSi2 99.5% -325 Mesh Inquire
Product ID
271400PD001
Formula
CoSi2
Purity
99.5%
Dimension
-325 Mesh

Cobalt Silicide Powder Overview

Cobalt Silicide powder is a high-purity cobalt silicide powder with excellent electrical conductivity and thermal stability, widely used in semiconductor devices and microelectronic thin film deposition.

We offer cobalt silicide powder in various particle sizes, purities, and packaging specifications, and support sample testing and technical consultation. Please contact us for detailed information and application solutions.

Product Highlights

Uniform and dense crystal structure

Excellent electrical conductivity

Good thermal stability

Chemically stable

Customizable particle size and purity

Strictly controlled batch consistency

Flexible delivery time

Applications of Cobalt Silicide Powder

Semiconductor Devices: CoSi2 powder is used to prepare metallization layers in semiconductor devices, improving device conductivity and stability.

Microelectronic Thin Film Deposition: Suitable for thin film deposition in microelectronic devices, ensuring dense, uniform films and reliable electrical performance.

High-Temperature Contact Materials: Can be used as contact materials in high-temperature environments, exhibiting good thermal stability and electrical conductivity.

Research and Materials Development: Widely used in research institutions and corporate R&D departments for new material performance testing and process optimization.

FAQs

Q1: Which deposition processes is Cobalt Silicide powder suitable for?

A1: It can be used in microelectronic thin film processes such as magnetron sputtering, RF sputtering, and chemical vapor deposition.

Q2: Does powder particle size affect deposition results?

A2: Yes, particle size uniformity directly affects the density and electrical properties of the deposited film. The appropriate particle size should be selected based on the application.

Q3: What precautions should be taken when storing CoSi2 powder?

A3: It is recommended to store it in a sealed, dry, and ventilated environment, avoiding moisture and contamination to ensure powder performance stability.

Q4: Can you provide CoSi2 powder of different purity grades?

A4: Yes, we can provide high-purity or specific purity grades of powder according to customer requirements.

Reports

Each batch is supplied with:

Certificate of Analysis (COA)

Technical Data Sheet (TDS)

Material Safety Data Sheet (MSDS)

Third-party testing reports available upon request

Why Choose Us?

We focus on the research and development and stable supply of high-purity cobalt silicide powder. With a mature quality management system and flexible customization capabilities, we can provide customers with reliable, traceable powder solutions suitable for scientific research and industrial applications, helping projects to proceed efficiently.

Molecular Formula: CoSi₂

Molecular Weight: 115.11 g/mol

Appearance: Silver-gray to black

Density: 6.00 g/cm³

Melting Point: 1,400 ℃

Crystal Structure: Face-centered cubic

Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.

Outer Packaging: Cartons or wooden crates selected based on size and weight.

SKU 271400PD Category Tags:

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