| Product ID | Formula | Purity | Dimension | Inquiry |
|---|---|---|---|---|
| 270801ST001 | CoO | 99.9% | Ø 152.4 mm x 6.35 mm | Inquire |
| 270801ST002 | CoO | 99.95% | Ø 25.4 mm x 6.35 mm | Inquire |
| 270801ST003 | CoO | 99.95% | Ø 50.8 mm x 3.175 mm | Inquire |
| 270801ST004 | CoO | 99.95% | Ø 76.2 mm x 3.175 mm | Inquire |
| 270801ST005 | CoO | 99.95% | Ø 101.6 mm x 6.35 mm | Inquire |
| 270801ST006 | CoO | 99.95% | Ø 203.2 mm x 3.175 mm | Inquire |
Cobalt Monoxide sputtering targets are high-purity cobalt oxide targets with excellent magnetic and chemical stability, widely used in the deposition of magnetic thin films, batteries, and electronic devices.
We offer CoO sputtering targets of various sizes, crystal forms, and purity grades, and support sample testing and technical consultation. Please contact us for detailed information and application suggestions.
Dense and uniform crystal structure
Good magnetic stability
Excellent thermal stability
Wear and corrosion resistant
Suitable for various sputtering processes
Flexible customization of size and crystal form
Strict batch consistency control
Flexible delivery cycle
Can be used in conjunction with scientific research experiments and process development
Magnetic Thin Film Preparation: Suitable for preparing high-performance magnetic thin films for magnetic storage, sensors, and microelectronic devices, ensuring stable magnetic properties.
Electronic Device Deposition: Used for thin film deposition in electronic devices to improve device functional stability and reliability.
Battery Material Thin Films: Can be used in the preparation of positive electrode thin films for lithium-ion batteries and other energy devices, improving battery capacity and cycle performance.
Research and Process Development: Widely used in research institutions and corporate R&D departments for material performance testing and process parameter optimization.
Q1: Which sputtering processes are Cobalt Monoxide sputtering targets suitable for?
A1: Suitable for magnetron sputtering, RF sputtering, and DC sputtering equipment. Specifications can be selected according to power and target size.
Q2: Can the target crystal form be customized?
A2: Yes, we can provide targets with different crystal forms according to customer needs to meet application performance requirements.
Q3: Are targets prone to cracking or porosity during sputtering?
A3: Prepared using a high-density metallurgical process, the grains are uniform, effectively reducing the risk of cracking and porosity.
Q4: What precautions should be taken when storing targets?
A4: It is recommended to store in a dry, ventilated environment, avoiding moisture, contamination, and prolonged exposure to air to maintain performance stability.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We specialize in the R&D and stable supply of high-purity cobalt oxide sputtering targets. With a comprehensive quality management system and flexible customization capabilities, we can provide customers with reliable, traceable target solutions suitable for scientific research and industrial applications, helping projects progress efficiently.
Molecular Formula: CoO
Molecular Weight: 74.93 g/mol
Appearance: Black metallic target material with a smooth and uniform surface
Density: 6.44 g/cm³
Melting Point: 1,500 ℃
Crystal Structure: Cubic
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
