Cobalt Iron Oxide

Cobalt Iron Oxide Sputtering Targets Overview

Cobalt iron oxide sputtering targets are high-performance oxide targets that combine stable magnetism, wear resistance, and chemical stability, making them widely used in the fabrication of magnetic thin films and electronic devices.

We offer cobalt iron oxide sputtering targets in various sizes, crystal forms, and purity grades, and support technical consultation and sample testing. Please contact us for more information.

Product Highlights

Excellent magnetic properties
Wear and corrosion resistance
Good thermal stability
Suitable for various sputtering processes
Flexible customization of size and crystal form
After-sales and technical support
Material selection advice provided

Applications of Cobalt Iron Oxide Sputtering Targets

Magnetic Thin Film Fabrication: Cobalt iron oxide sputtering targets are suitable for fabricating high-performance magnetic thin films for magnetic storage devices, sensors, and microelectronic devices, ensuring performance stability.
Electronic Device Deposition: Can be used for thin film deposition in electronic devices, improving the stability and reliability of device functionality.
Catalytic Functional Coatings: Suitable for preparing functional catalytic coatings, ensuring uniform distribution of active components and improving catalytic efficiency.
Research and Process Development: Widely used in research institutions and corporate R&D departments for performance testing and process parameter optimization of magnetic thin film materials.

FAQs

Q1: Which type of sputtering equipment is the Cobalt Iron Oxide sputtering target suitable for?
A1: It can be used in magnetron sputtering, RF sputtering, and DC sputtering equipment. Target specifications are selected based on power and size.

Q2: Can the target crystal form be customized?
A2: Yes, we support providing different crystal forms of targets according to application requirements to meet performance requirements.

Q3: Is the target prone to cracking or porosity?
A3: Prepared using a high-density metallurgical process, the uniform microstructure effectively reduces the risk of cracking and porosity.

Q4: What precautions should be taken when storing the target?
A4: It is recommended to store it in a dry, ventilated environment, avoiding moisture, contamination, and prolonged exposure to air to maintain performance stability.

Reports

Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request

Why Choose Us?

We specialize in the R&D and stable supply of high-performance cobalt iron oxide sputtering targets. With a mature quality management system and flexible customization capabilities, we can provide customers with reliable, traceable target solutions suitable for scientific research and industrial applications, helping projects progress efficiently.