ULPMAT

Cobalt Iron Boron

Chemical Name:
Cobalt Iron Boron
Formula:
CoFeB
Product No.:
27260500
CAS No.:
EINECS No.:
Form:
Sputtering Target
HazMat:
Product ID Formula Purity Dimension Inquiry
27260500ST001 CoFeB 40:40:20 at% Ø 50.8 mm x 3.175 mm Inquire
Product ID
27260500ST001
Formula
CoFeB
Purity
40:40:20 at%
Dimension
Ø 50.8 mm x 3.175 mm

Cobalt Iron Boron Sputtering Targets Overview

Cobalt Iron Boron sputtering targets are high-performance magnetic alloy targets, possessing high permeability, wear resistance, and thermal stability. They are widely used in the manufacture of magnetic thin films and electronic devices.

We offer CoFeB sputtering targets in various sizes, composition ratios, and purity grades, and support sample testing and technical consultation. Please contact us for detailed information.

Product Highlights

Dense microstructure, uniform grains
Excellent magnetic properties
Good thermal stability
Wear and corrosion resistance
Customizable size and composition ratios
Small and large batch supply
Material selection advice provided

Applications of Cobalt Iron Boron Sputtering Targets

Magnetic Thin Film Preparation: Cobalt Iron Boron sputtering targets can be used to prepare high-performance magnetic thin films for applications in magnetic recording, sensors, and microelectronic devices, ensuring stable magnetic properties.
Electronic Device Deposition: Suitable for thin film deposition of electronic components, improving device functional stability and reliability.
Research and Process Development: Widely used in research institutions and corporate R&D departments for magnetic material performance research and process parameter optimization.
Functional Coatings and Energy Devices: Cobalt Iron Boron sputtering targets can be used to prepare functional coatings and magnetic energy devices, improving material performance and efficiency.

FAQs

Q1: What types of sputtering equipment are Cobalt Iron Boron sputtering targets suitable for?
A1: They can be used in magnetron sputtering, DC sputtering, and RF sputtering equipment. Specifications are selected based on the equipment power and target size.

Q2: Can the target thickness and diameter be customized?
A2: Yes, we can provide targets with different thicknesses and diameters according to customer equipment requirements.

Q3: Are targets prone to cracking or porosity?
A3: Prepared using a high-density metallurgical process, the grains are uniform, effectively reducing the risk of cracking and porosity.

Q4: What precautions should be taken when storing the target?
A4: It is recommended to store in a dry, well-ventilated environment, avoiding moisture, contamination, and prolonged oxidation to ensure performance stability.

Reports

Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request

Why Choose Us?

We specialize in the R&D and stable supply of high-performance cobalt-iron-boron alloy sputtering targets. With a mature quality management system and flexible customization capabilities, we can provide customers with reliable, traceable target solutions suitable for scientific research and industrial applications, helping projects progress efficiently.

Molecular Formula: CoFeB
Appearance: metallic silver-gray

Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.

Outer Packaging: Cartons or wooden crates selected based on size and weight.

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