ULPMAT

Cobalt Boride

Chemical Name:
Cobalt Boride
Formula:
CoB
Product No.:
270500
CAS No.:
EINECS No.:
Form:
Sputtering Target
HazMat:
Product ID Formula Purity Dimension Inquiry
270500ST001 CoB 99.9% Ø 50.8 mm x 6.35 mm Inquire
270500ST002 CoB 99.9% Ø 101.6 mm x 3.175 mm Inquire
Product ID
270500ST001
Formula
CoB
Purity
99.9%
Dimension
Ø 50.8 mm x 6.35 mm
Product ID
270500ST002
Formula
CoB
Purity
99.9%
Dimension
Ø 101.6 mm x 3.175 mm

Overview of Cobalt Boride Sputtering Targets

Cobalt Boride sputtering targets are high-performance ceramic targets for physical vapor deposition (PVD), specifically designed for depositing cobalt boride thin films that offer excellent wear resistance, high hardness, and good chemical stability.

We offer high-quality, high-purity Cobalt Boride targets, supporting bonding and size customization. Contact us for detailed technical information and solutions.

Product Highlights

Strict Quality Control: Precise control of chemical composition and microstructure ensures stable film performance.
Superior Density: Advanced sintering processes ensure high density and low porosity, improving sputtering efficiency and film quality.
Stable Sputtering: Strict control of low-melting-point boron oxide content effectively suppresses dust generation and abnormal discharge during sputtering.
Professional Bonding: Optimized backplane bonding solutions ensure excellent thermal conductivity and mechanical stability, extending target life.
Flexible Customization: Supports the research and development and production of targets with non-standard sizes, shapes, and specific composition ratios.
Full Support: We provide comprehensive pre-sales and after-sales technical services, from selection and installation guidance to process optimization.

Applications of Cobalt Boride Sputtering Targets

Superhard Wear-Resistant Coatings: The deposited cobalt boride films have extremely high hardness, making them ideal for surface strengthening of tools, molds, and critical mechanical components, significantly improving wear resistance and service life.
Electronic Thin Film Materials: In the microelectronics field, they can be used to deposit special diffusion barrier layers or functional thin films to meet the stringent electrical and stability requirements of specific devices.
Cutting-Edge Technology R&D: As a high-performance compound coating material, it provides a key thin film deposition source for basic research and application development in fields such as new materials and new energy.

FAQs

Q1: Why is it necessary to specifically control the boron oxide content during Cobalt Boride sputtering?
A1: Excessive free boron oxide may melt during sputtering heating, becoming a source of dust particles and abnormal arcs. Strictly controlling its content is crucial for obtaining clean and uniform thin films.

Q2: In which industrial fields is this target typically used?
A2: It is mainly used in fields with extremely high requirements for surface hardness and wear resistance, such as protective coatings for high-end cutting tools and precision molds. It is also used in the preparation of certain special functional films.

Q3: How do you ensure the consistency of performance between different batches of target materials?
A3: We implement strict standards from raw material purity and preparation process to final testing. We conduct batch-level monitoring of key indicators such as composition, density, and grain size to ensure stable and reliable performance.

Q4: Can you customize target materials for our new equipment or special applications?
A4: Yes. We offer comprehensive customization services, customizing target materials of different shapes, sizes, and composition ratios according to your equipment cavity design and coating process requirements.

Reports

Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request

Why Choose Us?

We have deep expertise in the field of high-performance compound sputtering targets, possessing a profound understanding of the core technological challenges and application requirements of Cobalt Boride materials. We not only provide products that meet high industry standards, but also dedicate ourselves to solving your practical problems in coating processes through professional material design and process control. Choosing us means choosing a reliable partner backed by technological innovation and focused on your process success.

Molecular Formula: CoB
Molecular Weight: 69.74 g/mol
Appearance: Dark gray to grayish-black
Theoretical Density: Approximately 7.30 g/cm³

Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.

Outer Packaging: Cartons or wooden crates selected based on size and weight.

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