Chromium Zirconium sputtering targets are high-performance chromium and zirconium alloys primarily used in the electronics, optics, and coating technologies fields. Their excellent high-temperature resistance and oxidation resistance make them widely applicable in high-precision thin film deposition and high-strength surface treatment.
We offer customized Chromium Zirconium sputtering targets to meet your needs in various applications. Please contact us with any questions or customization requirements.
Superior high-temperature resistance
Excellent oxidation resistance
High sputtering efficiency and stable film quality
Customization services available
Good mechanical strength and toughness
Adaptable to various environmental applications
Thin Film Deposition: Widely used in the semiconductor industry, sputtering technology generates high-quality thin films, ensuring the stability of high-precision equipment and devices.
Optical Coating: Used in optical equipment to enhance the reflectivity and wear resistance of optical components, applied in lasers, lenses, and displays.
High-Temperature Coating: Its superior high-temperature resistance makes this target widely used in the aerospace and automotive industries, providing solutions for high-strength surface coatings.
Surface Treatment: Used for surface treatment of mechanical parts and tools, improving wear resistance and corrosion resistance through the deposition of hard coatings, ensuring long-term equipment reliability.
Q1: How is Chromium Zirconium sputtering performed?
A1: Magnetron sputtering technology is used to sputter uniform thin films in a high-vacuum environment, suitable for electronics, optics, and other fields.
Q2: What precautions should be taken when using it?
A2: When using Chromium Zirconium targets, the sputtering environment should be kept stable to avoid temperature fluctuations. The target surface should be inspected regularly to prevent contaminants from affecting the sputtering effect.
Q3: How is the backplate bonded to the target?
A3: Bonding the backplate to the target typically uses welding or adhesive techniques to ensure the target is firmly attached to the backplate, avoiding instability during sputtering.
Q4: What is the sputtering efficiency of this target? A4: Chromium Zirconium sputtering targets offer high sputtering efficiency, enabling efficient sputtering processes while maintaining stable film quality, making them suitable for various demanding applications.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We have many years of experience in manufacturing Chromium Zirconium sputtering targets and can provide customized products to meet diverse customer needs. Our rigorous production processes and comprehensive quality control ensure that every batch of targets meets high standards, helping customers achieve optimal performance in advanced technology applications.
Molecular formula: CrZr
Appearance: Silver-gray target material
Crystal structure: Body-centered cubic (BCC)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
