Chromium Silicion Aluminum Alloy sputtering targets are composed of an alloy of chromium, silicon, and aluminum, possessing excellent high-temperature resistance and oxidation resistance, and are widely used in thin film deposition and high-performance coatings. Their superior physical properties make them ideal for electronics, optics, and high-temperature coating applications.
We offer high-quality CrSiAl sputtering targets suitable for various high-temperature and high-intensity applications, meeting diverse customer technical needs. Please feel free to contact us with any customization requirements or technical questions.
Excellent high-temperature stability
Good oxidation and corrosion resistance
High sputtering efficiency and uniform film quality
Strong mechanical strength
Customizable sizes and specifications available
Meets application requirements in special environments
Thin Film Deposition: Widely used in semiconductor, optoelectronic, and display technologies for thin film deposition, producing high-quality, uniform films that meet precision requirements.
Optical Coating: This target material has important applications in the field of optical coatings, used to improve the reflectivity and wear resistance of optical components, and is widely used in lenses, lasers, and other devices.
High-Temperature Coating: This target material has excellent high-temperature resistance, suitable for aerospace, automotive industries, and other applications requiring high-temperature coating protection.
Metal Surface Treatment: Its high strength and corrosion resistance make CrSiAl targets an ideal choice for metal surface treatment, effectively improving the wear resistance and oxidation resistance of metal parts.
Q1: How is Chromium Silicion Aluminum Alloy sputtering performed?
A1: Magnetron sputtering technology is typically used for thin film deposition. This high-efficiency sputtering technique generates uniform thin films and is widely used in semiconductors, optical coatings, and other fields.
Q2: What precautions should be taken when using Chromium Silicion Aluminum Alloy sputtering targets?
A2: When using the target, it is important to ensure a stable sputtering environment, avoid excessive temperature fluctuations, and clean the target surface regularly to maintain stable sputtering results.
Q3: How is bonding between the backplate and the CrSiAl sputtering target performed?
A3: Bonding between the backplate and the target typically employs welding or adhesive techniques. Depending on the application requirements, we can provide different bonding methods to ensure stable target adhesion and effective sputtering.
Q4: What industries and environments are CrSiAl sputtering targets suitable for?
A4: They are used in many high-end fields such as semiconductors, optics, aerospace, and automotive industries, and are particularly suitable for high-temperature and high-intensity working environments.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We are a professional manufacturer of CrSiAl sputtering targets, possessing advanced production processes and a rigorous quality control system. We are committed to providing high-quality sputtering targets and offer customized services and technical support according to customer needs, ensuring the stability and reliability of every batch of products.
Molecular formula: CrSiAl
Appearance: Silver-gray target material
Crystal structure: Face-centered cubic (FCC)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
