Chromium Silicion Alloy sputtering targets are composed of an alloy of chromium and silicon, exhibiting excellent high-temperature resistance, oxidation resistance, and corrosion resistance. They are widely used in thin film deposition and high-performance coatings. They are commonly used in demanding fields such as semiconductor manufacturing, optical coatings, and metal surface treatment.
We offer high-quality CrSi sputtering targets suitable for thin film deposition in high-temperature and extreme environments. Please feel free to contact us with any customization needs or technical questions.
Excellent high-temperature stability
Strong oxidation resistance
High sputtering efficiency and uniform film quality
Good mechanical strength
Custom sizes and specifications available
Suitable for various high-temperature and extreme environments
Thin Film Deposition: Used in the semiconductor industry for thin film deposition, producing uniform and high-quality films that meet high precision and high efficiency requirements.
Optical Coatings: This target is widely used in optical coating production, especially in high-reflection and anti-reflection coatings, improving the stability, abrasion resistance, and high-temperature resistance of optical components.
High-Temperature Coatings: CrSi targets possess excellent high-temperature resistance, making them suitable for coating applications in automotive, aerospace, and high-temperature tools, providing superior protection under extreme conditions.
Surface Treatment: This target can be used for metal surface treatment and hardening coatings, improving the corrosion resistance and wear resistance of metal components. It is widely used in machinery, electronics, and precision manufacturing industries.
Q1: How is CrSi sputtering performed?
A1: Targets are generally used for thin film deposition using magnetron sputtering technology. This method provides uniform and high-quality films and is widely used in semiconductor and optical coating fields.
Q2: What precautions should be taken when using Chromium Silicion Alloy sputtering targets?
A2: During use, ensure a stable sputtering environment, avoiding temperature and atmosphere fluctuations to guarantee film quality. The target surface should be cleaned regularly to prevent contaminants from interfering with the sputtering process.
Q3: How is bonding between the backplate and the CrSi target performed?
A3: Bonding between the backplate and the target typically uses welding or adhesive techniques to ensure the target is firmly attached to the backplate. We can provide different bonding methods according to customer needs, ensuring efficient and stable sputtering performance.
Q4: How to maintain the stability of CrSi sputtering targets during use?
A4: To ensure stability, it is recommended to avoid contamination of the target surface during use and to maintain a stable atmosphere in the sputtering environment to avoid affecting film quality.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We are a professional CrSi sputtering target manufacturer, committed to providing high-quality products and customized solutions. With strict quality control and advanced production processes, we can meet the diverse needs of our customers, ensuring timely and reliable delivery. Choosing us will give you high-quality products and professional technical support, helping your projects succeed.
Molecular formula: CrSi
Appearance: Silver-gray target material
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
