Chromium Nickel Aluminum Alloy sputtering targets are composed of an alloy of chromium, nickel, and aluminum, exhibiting excellent corrosion resistance, high-temperature resistance, and oxidation resistance. They are widely used in thin film deposition, optical coating, and the semiconductor industry to meet the demands of high-precision thin film manufacturing.
We offer high-quality Chromium Nickel Aluminum Alloy sputtering targets, customizable to your needs, ensuring superior performance in a variety of applications. Please feel free to contact us with any needs or technical questions.
Excellent corrosion and oxidation resistance
Good high-temperature stability
Outstanding sputtering efficiency
Provides uniform and high-quality thin films
Good mechanical strength
Suitable for various specialized applications
Thin Film Deposition: This sputtering target has wide applications in thin film deposition in semiconductors, solar cells, and optoelectronic devices, providing high-quality, uniform thin films that effectively improve device functionality and stability.
Optical Coatings: In the field of optical coatings, the target material can be used to deposit high-reflectivity and anti-reflectivity films, widely applied in laser technology, optical lenses, and other products to improve their durability and optical performance.
High-Temperature Coatings: This target material possesses excellent high-temperature performance and can be used in coating technologies for high-temperature environments. It is widely used in aerospace, automotive industries, and other fields, providing excellent wear and corrosion resistance.
Electronic Component Manufacturing: In the manufacturing of electronic components, the target material can be used to deposit conductive thin films and metal layers, improving the electrical performance and stability of electronic devices.
Q1: What is the sputtering efficiency of the Chromium Nickel Aluminum Alloy sputtering target?
A1: This sputtering target has excellent sputtering efficiency, enabling high-quality thin film deposition in a short time, making it ideal for large-scale production needs.
Q2: What precautions should be taken when using the Chromium Nickel Aluminum Alloy sputtering target?
A2: Maintaining a stable sputtering environment is crucial, avoiding drastic fluctuations in temperature and atmosphere to ensure film quality. Simultaneously, the target surface should be kept clean to prevent contaminants from interfering with the sputtering process.
Q3: How is the backplate bonded to the Chromium Nickel Aluminum Alloy sputtering target?
A3: Bonding the backplate to the target typically employs welding or adhesive techniques to ensure the target adheres firmly to the backplate, thereby achieving stable sputtering performance. We can provide different backplate bonding technologies according to customer requirements.
Q4: How stable is the Chromium Nickel Aluminum Alloy sputtering target at high temperatures?
A4: This sputtering target exhibits excellent high-temperature resistance, maintaining good sputtering performance even in high-temperature environments, making it suitable for high-temperature coatings and high-performance alloy applications.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We specialize in manufacturing high-quality Chromium Nickel Aluminum Alloy sputtering targets, possessing advanced production technology and a rigorous quality control system. By choosing us, you will receive efficient products, timely delivery, and comprehensive after-sales service to help your projects proceed smoothly.
Molecular formula: CrNiAl
Appearance: Silver-gray target material
Crystal structure: Face-centered cubic (FCC)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
