ULPMAT

Chromium Molybdenum Tantalum Titanium Vanadium Tungsten alloy

Chemical Name:
Chromium Molybdenum Tantalum Titanium Vanadium Tungsten alloy
Formula:
CrMoTaTiVW
Product No.:
24427322237400
CAS No.:
EINECS No.:
Form:
Sputtering Target
HazMat:
Product ID Formula Purity Dimension Inquiry
24427322237400ST001 CrMoTaTiVW 99% Ø 12.7 mm x 114.3 mm Inquire
Product ID
24427322237400ST001
Formula
CrMoTaTiVW
Purity
99%
Dimension
Ø 12.7 mm x 114.3 mm

Overview of Chromium Molybdenum Tantalum Titanium Vanadium Tungsten Alloy Sputtering Targets

Chromium Molybdenum Tantalum Titanium Vanadium Tungsten alloy sputtering targets are composed of chromium, molybdenum, tantalum, titanium, tungsten, and vanadium alloys, exhibiting excellent high-temperature resistance, corrosion resistance, and high strength. They are widely used in thin film deposition, coating manufacturing, and the research and development of high-performance alloys, and are particularly suitable for high-end technology fields operating in extreme environments.

We offer CrMoTaTiVW sputtering targets to meet diverse thin film deposition and coating needs, guaranteeing high quality and customized services. Please feel free to contact us with any questions or requirements.

Product Highlights

Superior high temperature resistance and corrosion resistance
High mechanical strength and wear resistance
Excellent sputtering efficiency and film quality
High stability and long-term performance guarantee
Customizable specifications available
Adaptable to various application environments

Applications of Chromium Molybdenum Tantalum Titanium Vanadium Tungsten alloy

Thin Film Deposition: This target is widely used in the semiconductor, optoelectronic, and solar cell industries for thin film deposition, providing high-quality, uniform thin film layers for precision equipment.

Coating Technology: This target can be used to prepare hard coatings, exhibiting excellent wear resistance and corrosion resistance. It is widely used in the automotive, aerospace, and mechanical parts industries, increasing equipment lifespan and durability.

High Temperature Alloy Manufacturing: This target plays a crucial role in the production of high temperature alloys, especially in aerospace and high-energy applications, ensuring the stability and strength of materials under extreme temperatures.

Optical Coatings and Functional Thin Films: Suitable for the deposition of functional thin films such as high-reflection and anti-reflection films for optical devices, widely used in laser equipment, optical lenses, and other fields, improving device performance and stability.

FAQs

Q1: What is the sputtering efficiency of Chromium Molybdenum Tantalum Titanium Vanadium Tungsten alloy sputtering targets?
A1: The targets have excellent sputtering efficiency, enabling the efficient deposition of uniform thin films under appropriate conditions, making them suitable for large-scale production.

Q2: What precautions should be taken when using CrMoTaTiVW sputtering targets?
A2: During use, it is necessary to ensure that the target surface is free of contamination, and that the temperature and atmosphere of the sputtering environment are stable to avoid affecting film quality and target lifespan.

Q3: How is bonding between the backplate and the target performed?
A3: Bonding between the backplate and the target typically employs welding or adhesive techniques to ensure a firm adhesion of the target to the backplate, providing stable sputtering performance. We can provide different types of bonding solutions according to customer needs.

Q4: How well do CrMoTaTiVW sputtering targets perform in extreme environments?
A4: The targets possess excellent high-temperature resistance and corrosion resistance, enabling stable operation in high-temperature, high-load environments, making them particularly suitable for aerospace, energy, and other fields.

Reports

Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request

Why Choose Us?

We specialize in manufacturing high-quality CrMoTaTiVW sputtering targets, possessing advanced production equipment and a rigorous quality management system. Choosing us will provide you with stable, reliable products, fast delivery, and comprehensive technical support to help your projects progress smoothly.

Molecular Formula: CrMoTaTiVW
Appearance: Silver-gray target material
Crystal Structure: Body-centered cubic (BCC)

Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.

Outer Packaging: Cartons or wooden crates selected based on size and weight.

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