Chromium Aluminum Carbide sputtering targets are high-performance materials with excellent thermal stability and oxidation resistance, suitable for high-temperature and highly corrosive environments. They are commonly used in thin film deposition and advanced coating technologies, and are widely applied in electronics, aerospace, and materials science.
We offer high-purity Cr2AlC sputtering targets, ensuring stable operation in complex deposition processes. Please feel free to contact us with any specific product requirements or technical questions.
High Thermal Stability
Excellent Oxidation Resistance
Precise Target Size and Shape
Good Electrical Conductivity
Customizable Bonding and Backing Plate
Suitable for Advanced Coating and Thin Film Deposition
Strong Customization Capabilities
Thin Film Deposition: Used for depositing high-performance thin films, especially in the manufacture of semiconductor and optical devices, improving product durability and functionality.
Anti-corrosion Coatings: Widely used in the aerospace industry as anti-corrosion coatings, they remain stable in extreme high-temperature and harsh environments, protecting equipment from corrosion.
Hard Coatings: The high hardness of Cr2AlC makes it suitable for hard coatings on tools and machinery, improving their wear resistance.
Electronic Devices: In the electronics industry, it is used as a coating and structural material for high-end components, enhancing device stability and durability.
Q1: What is the maximum operating temperature of the Chromium Aluminum Carbide sputtering target?
A1: Cr2AlC sputtering targets have excellent high-temperature performance, capable of stable operation at temperatures up to 1000°C, making them suitable for applications in high-temperature environments.
Q2: Which thin film deposition methods is this product suitable for?
A2: Suitable for various thin film deposition methods such as magnetron sputtering and ion sputtering, widely used in the production of high-end electronic devices and optical thin films.
Q3: Does the Chromium Aluminum Carbide sputtering target have oxidation resistance?
A3: Yes, it has excellent oxidation resistance and can be used stably for extended periods in high-temperature and corrosive environments.
Q4: What is the electrical conductivity of the Chromium Aluminum Carbide target?
A4: Excellent electrical conductivity, suitable for various electronic and electrical applications, ensuring stable electrical performance.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We specialize in the R&D and production of high-performance sputtering targets, possessing years of industry experience and technological accumulation. Choosing us will give you high-quality Cr2AlC sputtering targets, efficient customization services, and comprehensive technical support, helping you succeed in your applications.
Molecular Formula: Cr₂AlC
Molecular Weight: 151.99 g/mol
Appearance: Gray target material
Density: 6.1 g/cm³
Melting Point: ~1900 °C
Crystal Structure: Hexagonal (MAX phase)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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