Cesium Iodide

Cesium Iodide sputtering targets Overview

Cesium Iodide sputtering targets are high-purity materials designed specifically for the fabrication of optoelectronic devices and high-performance optical thin films, offering excellent density and uniform film formation. With a purity of 99.99%, these targets ensure deposited films possess excellent optical properties and stable chemical properties. They are widely used in photodetectors, scintillators, and radiation shielding coatings.

We offer Cesium Iodide sputtering targets in a variety of sizes and shapes, including round and rectangular shapes, and can be customized to meet customer needs. Comprehensive technical support and after-sales service ensure smooth production and R&D.

Product Highlights

Purity: 99.99%
High density ensures uniform thin film deposition
Customizable sizes and shapes to meet various process requirements
Target bonding services available
Suitable for optoelectronic devices, scintillators, and high-performance optical coatings

Applications of Cesium Iodide sputtering target

Optoelectronic devices: Used as functional thin film materials in photodetectors and imaging devices.
Scintillator materials: Widely used in medical imaging and nuclear radiation detectors.
Radiation shielding coatings: Used in the manufacture of X-ray shielding and protective materials for the nuclear industry. Optical Thin Films: Create highly transparent or reflective layers in mirrors and laser systems.

Reports

We provide a Certificate of Analysis (COA), Material Safety Data Sheet (MSDS), and relevant performance test reports for each batch of CsI sputtering targets. We support third-party testing to ensure consistent and reliable product quality.