ULPMAT

Cerium oxide

Chemical Name:
Cerium oxide
Formula:
CeO2
Product No.:
580800
CAS No.:
1306-38-3
EINECS No.:
215-150-4
Form:
Sputtering Target
HazMat:
Product ID Formula Purity Dimension Inquiry
580800ST001 CeO2 99.9% (REO) Ø 50.8 mm x 6.35 mm Inquire
580800ST002 CeO2 99.9% (REO) Ø 76.2 mm x 3.175 mm Inquire
580800ST003 CeO2 99.9% (REO) Ø 76.2 mm x 6.35 mm Inquire
580800ST004 CeO2 99.9% (REO) Ø 101.6 mm x 3.175 mm Inquire
580800ST005 CeO2 99.9% (REO) Ø 101.6 mm x 6.35 mm Inquire
Product ID
580800ST001
Formula
CeO2
Purity
99.9% (REO)
Dimension
Ø 50.8 mm x 6.35 mm
Product ID
580800ST002
Formula
CeO2
Purity
99.9% (REO)
Dimension
Ø 76.2 mm x 3.175 mm
Product ID
580800ST003
Formula
CeO2
Purity
99.9% (REO)
Dimension
Ø 76.2 mm x 6.35 mm
Product ID
580800ST004
Formula
CeO2
Purity
99.9% (REO)
Dimension
Ø 101.6 mm x 3.175 mm
Product ID
580800ST005
Formula
CeO2
Purity
99.9% (REO)
Dimension
Ø 101.6 mm x 6.35 mm

Cerium Oxide sputtering target Overview

Cerium Oxide sputtering targets are advanced ceramic materials developed for high-performance thin film deposition processes. They have excellent chemical stability, heat resistance and good optical properties, and are widely used in cutting-edge fields such as transparent conductive films, optical coatings, gas sensors and barrier layers.

We offer a variety of purity and size specifications, supporting round, rectangular and customized structures to meet different experimental and mass production needs. We also provide comprehensive after-sales support. If you have any questions about use, please feel free to contact us.

Product Highlights

Purity: 99.9%
Dense structure, excellent film uniformity and adhesion
Diameter, thickness and base material can be customized on demand
High heat resistance, strong chemical stability, suitable for sputtering processes in harsh environments
Target binding service can be provided

Applications of Cerium Oxide sputtering target

Optical coatings: cerium oxide sputtering target is used as reflective films, anti-reflective films or filter films, especially suitable for optical components in the ultraviolet and visible light bands.
Transparent electronic devices: used to manufacture transparent electrodes, oxide semiconductor films, etc.
Gas sensors: The oxygen storage properties of CeO2 make it a key material for highly sensitive gas sensors.
Barrier layer and interface engineering: in magnetic storage and semiconductor devices, it is used as a buffer layer or interface layer to improve device stability.

Reports

Each batch of products comes with a certificate of analysis (COA), material safety data sheet (MSDS), and supports third-party test reports required by customers. We also provide comprehensive after-sales service to ensure that you have no worries during use

FAQs

1.What is a Cerium Oxide sputtering target?
Cerium Oxide sputtering target is a high-purity CeO₂ ceramic material used to deposit cerium oxide thin films by sputtering. It is commonly used in optical coatings, functional oxide films, electronic materials, and materials research.

2.What is Cerium Oxide (CeO₂) sputtering used for?
CeO₂ sputtering is used to produce thin films for optical, electronic, dielectric, catalytic, and functional materials applications. The final application depends on film composition, substrate, deposition method, and process conditions.

3.Is Cerium Oxide a ceramic sputtering target?
Yes. Cerium Oxide is typically supplied as a ceramic sputtering target because CeO₂ is a refractory inorganic oxide with high melting temperature and is generally processed into dense ceramic forms for thin-film deposition.

4.Can Cerium Oxide targets be used for RF sputtering?
Yes. Because CeO₂ is an electrically insulating ceramic material, RF sputtering is commonly used for its deposition. The appropriate RF power, pressure, substrate temperature, and gas composition depend on the sputtering system and the required film properties.

5. What sputtering atmosphere is used for CeO₂ targets?
Argon is commonly used as the primary sputtering gas for CeO₂ targets. Oxygen may also be introduced when process conditions require control of film stoichiometry or oxygen content.

6.What purity is available for Cerium Oxide sputtering targets?
Cerium Oxide sputtering targets are available in different purity levels depending on the application and specification. Higher-purity grades are generally selected for applications where trace-element contamination can affect film performance.

7. What sizes and shapes are available for CeO₂ sputtering targets?
CeO₂ targets can be supplied in different shapes and dimensions, including configurations designed for specific sputtering equipment. Custom target dimensions, thicknesses, and bonding options may be available depending on the required specification.

8.How should a Cerium Oxide sputtering target be handled and stored?
The target should be handled with appropriate protective equipment and kept clean, dry, and protected from contamination. Avoid unnecessary mechanical impact, and follow the applicable SDS and equipment manufacturer’s handling procedures.

Molecular formula: CeO₂
Appearance: light yellow or white
Density: about 7.2 g/cm³
Melting point: about 2,400 °C
Thermal conductivity: about 12 W/m·K
Specific heat capacity: about 0.46 J/g·K
Coefficient of thermal expansion: about 10.7 × 10⁻⁶ /K
Chemical stability: good thermal stability in air, reversible adsorption capacity for oxygen

Inner packaging: Vacuum-sealed bag to protect against contamination and moisture.

Outer packaging: Carton or wooden box, depending on size and weight.

Fragile targets: Special protective packaging is used to ensure safe transport.

Contact Us

If you need any service, please contact us

More Information

more products

CONTACT US

Thermal Spray

Our website has been completely upgraded