Carbon sputtering targets are made from high-purity carbon materials, resulting in high target density and stable sputtering processes. They are primarily used for the preparation of carbon-based thin films and related functional coatings.
We offer a variety of carbon sputtering targets, supporting customized sizes and process matching. Please contact us directly for technical parameters and quotations.
High-purity carbon raw materials
Dense target structure
Good sputtering stability
High film uniformity
Flexible size specifications
Controllable delivery cycle
Carbon-based functional thin film deposition: Suitable for preparing uniform carbon thin films to meet various functional requirements.
Wear-resistant and protective coatings: Used in surface engineering to improve the wear resistance and operational stability of substrates.
Electronics and semiconductor related thin films: Applicable to thin film processes requiring high material purity and process stability.
Process development and parameter optimization: Suitable for research and pilot-scale stages, used to verify sputtering conditions and process routes.
Q1: Which sputtering processes are suitable for carbon sputtering targets?
A1: Applicable to common sputtering processes; specific details need to be confirmed based on equipment parameters.
Q2: What are the common sizes and specifications of sputtering targets?
A2: Supports multiple standard sizes, and can also be customized to meet requirements.
Q3: Is the target consumption uniform during use?
A3: Under reasonable process conditions, the target erosion is uniform, and the sputtering process is stable.
Q4: Do you support sample or small batch purchases?
A4: Supports sample and small batch orders for convenient initial testing and verification.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We specialize in carbon-based materials and sputtering targets, possessing stable raw material control and processing capabilities. We can quickly respond to inquiries and help customers efficiently advance projects.
Molecular Formula: C
Molecular Weight: 12.01 g/mol
Appearance: Black, dense target block
Density: 2.0–2.3 g/cm³ (graphite target)
Melting Point: 3550 °C (sublimation)
Crystal Structure: Hexagonal (graphite)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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