ULPMAT

Calcium Titanate (Calcium Titanium Oxide)

Chemical Name:
Calcium Titanate (Calcium Titanium Oxide)
Formula:
CaTiO3
Product No.:
20220800
CAS No.:
12049-50-2
EINECS No.:
234-988-1
Form:
Sputtering Target
HazMat:
Product ID Formula Purity Dimension Inquiry
20220800ST001 CaTiO3 99.99% Ø 50.8mm x 6.35mm Inquire
20220800ST002 CaTiO3 99.99% Ø 76.2mm x 6.35mm Inquire
20220800ST003 CaTiO3 99.99% Ø 101.6mm x 3.175mm Inquire
20220800ST004 CaTiO3 99.99% Ø 101.6mm x 6.35mm Inquire
Product ID
20220800ST001
Formula
CaTiO3
Purity
99.99%
Dimension
Ø 50.8mm x 6.35mm
Product ID
20220800ST002
Formula
CaTiO3
Purity
99.99%
Dimension
Ø 76.2mm x 6.35mm
Product ID
20220800ST003
Formula
CaTiO3
Purity
99.99%
Dimension
Ø 101.6mm x 3.175mm
Product ID
20220800ST004
Formula
CaTiO3
Purity
99.99%
Dimension
Ø 101.6mm x 6.35mm

Calcium Titanate Sputtering Targets Overview 

Calcium titanate sputtering targets are functional ceramic materials featuring a standard perovskite crystal structure, specifically designed for physical vapor deposition (PVD) processes. Through sputtering, they form high-quality, uniform calcium titanate films on substrates. These films play a critical role in advanced electronic components and optical coating applications due to their exceptional dielectric, ferroelectric, and optical properties.

We professionally manufacture and supply high-quality calcium titanate ceramic sputtering targets in various purities, dimensions, and crystalline orientations. Custom backing plate bonding services tailored to your equipment requirements are available. Contact us for customized solutions.

Product Highlights

High phase purity
Exceptional density
Selectable orientation
Strong chemical stability
Superior film quality

Applications of Calcium Titanate Sputtering Targets

High-Performance Capacitors & Memory Devices: Used for depositing high-dielectric-constant (high-k) films as core dielectric layers in DRAM or next-generation embedded capacitors, serving as a key material for achieving device miniaturization and high performance.

Optical Coatings and Photonic Devices: Leveraging its high refractive index and transparency across the ultraviolet to infrared spectrum, it enables fabrication of complex optical interference filters, anti-reflective coatings, and waveguide layers in integrated photonic circuits.

Optoelectronics and Sensors: As typical ferroelectric and multiferroic materials, their films serve as functional layers in non-volatile memory, piezoelectric sensors, photodetectors, and novel solar cells, offering rapid response and high sensitivity.

Fundamental Research in Superconductors and Quantum Materials: As critical substrate materials for epitaxial growth of high-temperature superconducting films or other complex oxide quantum materials, they form essential platforms for cutting-edge condensed matter physics and materials science research.

FAQs

Q1: What special precautions should be taken for storing and using calcium titanate targets?
A1: Although ceramic targets are more stable than powders, it is still recommended to store them sealed in a dry environment. Before use, to achieve optimal film performance, it is generally advisable to perform a pre-sputtering clean of the target surface to remove any potential surface oxides or contaminants.

Q2: Should RF or DC mode be used for sputtering with this target?
A2: Calcium titanate is a typical dielectric material requiring RF sputtering mode. DC mode cannot sustain stable glow discharge and is ineffective for sputtering such insulating targets.

Q3: How can the crystalline quality of the deposited film be controlled?
A3: The crystalline quality of the film is primarily influenced by substrate temperature, sputtering pressure, and power. Typically, appropriate substrate heating facilitates the formation of well-crystallized films. Selecting a target with specific crystalline orientation also promotes oriented growth of the film.

Q4: What is the approximate dielectric constant of calcium titanate films? How is it measured?
A4: The dielectric constant of these films varies significantly with process conditions, typically ranging between 150 and 300. It can be measured and calculated by depositing the film on a silicon wafer, fabricating a metal-insulator-metal capacitor structure, and utilizing an impedance analyzer.

Report

Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request

Why Choose Us?

We specialize in the R&D and production of high-performance ceramic sputtering targets, with deep expertise in the relationship between the precise preparation of perovskite oxide materials and thin-film processes. From the selection of high-purity raw materials and advanced forming/sintering techniques to final precision machining and non-destructive testing, we implement stringent controls at every stage to ensure targets exhibit exceptional microstructure and consistent performance.

Molecular Formula: CaTiO₃
Molecular Weight: 164.22 g/mol
Appearance: White solid target material
Density: 4.07 g/cm³
Melting Point: 1,735 °C
Crystal Structure: Tetragonal

Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.

Outer Packaging: Cartons or wooden crates selected based on size and weight.

Documents

No PDF files found.

Contact Us

If you need any service, please contact us

More Information

more products

CONTACT US

Thermal Spray

Our website has been completely upgraded