| Product ID | Formula | Purity | Dimension | Inquiry |
|---|---|---|---|---|
| 200900ST001 | CaF2 | 99.5% | Ø 25.4mm x 3.175mm | Inquire |
| 200900ST002 | CaF2 | 99.5% | Ø 50.8mm x 3.175mm | Inquire |
| 200900ST003 | CaF2 | 99.5% | Ø 50.8mm x 6.35mm | Inquire |
| 200900ST004 | CaF2 | 99.5% | Ø 76.2mm x 3.175mm | Inquire |
| 200900ST005 | CaF2 | 99.5% | Ø 76.2mm x 6.35mm | Inquire |
| 200900ST006 | CaF2 | 99.5% | Ø 101.6mm x 6.35mm | Inquire |
| 200900ST007 | CaF2 | 99.5% | Ø 203.2mm x 3.175mm | Inquire |
Calcium fluoride sputtering targets are high-purity, high-density ceramic targets used in physical vapor deposition (PVD) technology. Primarily employed for depositing calcium fluoride films with exceptional optical and chemical properties onto substrates, they serve as a critical core material for fabricating ultraviolet optical components, semiconductor functional layers, and specialty coatings.
We specialize in providing calcium fluoride sputtering targets ranging from high-purity to ultra-high-purity grades. We support customization in various sizes and shapes, along with high-strength metal backing plate bonding services. For customized solutions or performance parameters, please contact our technical team immediately.
Ultra-high purity
Exceptional density and microstructural homogeneity
Extremely low UV light absorption
Precision machining with high surface finish
Outstanding thermal shock resistance and sputtering stability
High-Performance Optical Coatings: Used to prepare anti-reflective coatings, protective films, and high-reflectivity coatings across the ultraviolet to infrared spectrum. Widely applied in optical components for high-energy laser systems, astronomical observation instruments, and advanced lithography equipment.
Semiconductors and Microelectronics: Serves as an insulating or passivation layer material in specific semiconductor processes. Its thin films exhibit excellent dielectric properties and chemical stability, enhancing device reliability.
Laser Components and Windows: Used for direct deposition of calcium fluoride films or fabrication of multilayer structures to produce high damage threshold laser windows, lenses, and nonlinear optical devices.
Research and Specialized Functional Coatings: Serves as a fundamental target material for exploring and developing cutting-edge fields such as novel low-refractive-index materials, ultra-hard coatings, and radiation-resistant coatings.
Q1: How significantly does target purity affect the performance of the final deposited film?
A1: Purity is one of the decisive factors. Excessive metal impurities and oxygen content can significantly increase absorption loss in the ultraviolet band and may introduce defects, affecting the laser damage threshold and long-term stability of the film.
Q2: Why does calcium fluoride target sometimes require reactive sputtering during the process?
A2: To precisely control the film’s stoichiometric ratio (calcium-to-fluorine ratio) and compensate for potential fluorine loss, a small amount of fluorine-containing reactive gas (e.g., CF₄) is typically introduced into the sputtering gas (e.g., argon) to achieve calcium fluoride films with optimal optical properties.
Q3: Is this target material conductive? How is it installed and used in sputtering equipment?
A3: Calcium fluoride is an insulating material and does not conduct electricity. Therefore, an RF power supply must be used in magnetron sputtering, and the backing plate must be securely bonded to ensure effective cooling. During installation, ensure the contact surface between the target and the equipment base is clean and flat to guarantee efficient heat transfer.
Q4: What color do films deposited using this target typically exhibit?
A4: High-quality calcium fluoride films are nearly completely transparent in the visible spectrum with no discernible color. If the film appears pale yellow or exhibits other tints, this may indicate deviations in stoichiometry or contamination, necessitating optimization of process parameters.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We specialize in the R&D and manufacturing of advanced optical coatings and ceramic targets for semiconductors, with deep expertise in the challenges and process requirements for producing high-purity fluoride materials. Through proprietary purification and hot-press sintering technologies, we achieve an exceptional balance of purity, density, and microstructure in our targets.
Molecular Formula: CaF₂
Molecular Weight: 78.07 g/mol
Appearance: White solid
Density: 3.18 g/cm³
Melting Point: 1,418 °C
Boiling Point: 2,533 °C
Crystal Structure: Face-centered cubic
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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