Calcium aluminate sputtering targets are high-purity ceramic targets used in physical vapor deposition (PVD) technology. They are primarily employed to deposit calcium aluminate films with superior optical, electrical, or protective properties onto substrate surfaces, finding extensive applications in optoelectronics, display technology, and surface engineering.
We specialize in manufacturing and supplying high-density, high-purity calcium aluminate sputtering targets in various specifications. Custom sizing and bonding services are available. For technical consultation or sample evaluation, please contact us at any time.
Ultra-high purity and density
Superior microstructure
Diverse specification options
Reliable bonding process
Optical Coating Applications: Used to prepare anti-reflective coatings, protective films, or functional films with specific refractive indices for optical components, enhancing optical system performance.
Electronics and Display Technology: Serves as dielectric or buffer layer material in thin-film deposition processes for flat-panel displays, semiconductor devices, and storage components.
Wear-Resistant Protective Coatings: Depositing calcium aluminate films on tools, molds, or precision components significantly enhances surface hardness, wear resistance, and corrosion resistance.
Emerging Functional Materials Research: Serves as a fundamental sputtering source for exploring novel ferroelectric, fluorescent, or catalytic thin-film materials, supporting cutting-edge scientific research and high-end product development.
Q1: What special process parameters are required for calcium aluminate targets during sputtering?
A1: Reactive sputtering under appropriate power and oxygen partial pressure conditions is generally recommended to achieve films with accurate stoichiometric ratios. Specific parameters require optimization based on your equipment and film requirements.
Q2: How do target density and purity affect the final film?
A2: High density effectively reduces particle splatter during sputtering, enhancing film compactness. High purity is crucial for ensuring precise chemical composition, stable performance, and minimal impurities or defects in the film.
Q3: Do you offer customization for small-sized or special-shaped targets?
A3: Yes. We provide customized target solutions in special dimensions, shapes, or composite structures to meet your R&D or small-batch production needs. Please consult our technical team for detailed discussions.
Q4: What is the typical lifespan of a target, and what factors influence it?
A4: Lifespan depends on multiple factors including sputtering power, uniformity of the etched area, and cooling efficiency. Proper usage and ensuring adequate target surface cooling are effective methods to extend its lifespan.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We specialize in the R&D and manufacturing of advanced ceramic sputtering targets, deeply understanding the core quality requirements for targets in thin-film deposition processes. From high-purity powder synthesis and precision forming/sintering to rigorous non-destructive testing, we implement meticulous management throughout the entire process. We are committed to becoming your trusted core materials supplier in new material development and industrialization, delivering exceptional product performance, professional pre-sales technical support, and reliable delivery capabilities.
Molecular Formula: CaAl₂O₄
Molecular Weight: 146.11 g/mol
Appearance: White or light gray target material
Density: 3.31 g/cm³
Melting Point: 1,760 °C
Crystal Structure: Tetragonal
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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