Cadmium oxide sputtering targets are high-performance transparent conductive oxide materials with excellent electrical conductivity and optical transmittance, widely used in the fabrication of optoelectronic devices, functional thin films, and photovoltaic materials. Their superior thermal stability and uniform, dense structure make them an irreplaceable material in scientific research and industrial thin film deposition processes.
We offer high-purity cadmium oxide sputtering targets in custom sizes and thicknesses to meet diverse needs in scientific research and industrial production. For product quotations, samples, or technical information, please click to contact us. Our professional team will provide you with rapid response and comprehensive technical support to help you successfully complete thin film fabrication.
High density, excellent target compactness
Excellent electrical conductivity and optical transmittance
Supports round, square, and custom specifications
High temperature resistance, chemically stable
Target bonding services available
High batch consistency, repeatable performance
Compatible with various DC/RF sputtering equipment
Fast delivery, supports global shipping
Preparation of transparent conductive thin films for displays and optoelectronic devices.
High uniformity deposition for photovoltaic devices and functional thin films.
Suitable for semiconductor thin film preparation in scientific research and industrial experiments.
Q1: How is the packaging of CdO sputtering targets ensured for safe transportation?
A1: The targets are encapsulated with inert gas protection, supplemented by shockproof packaging and a rigid outer shell to ensure they are not damaged or contaminated during transportation.
Q2: What are the core advantages of CdO sputtering targets?
A2: Our CdO sputtering targets feature high purity, a dense and uniform structure, and excellent conductivity and transparency, ensuring uniformity and performance stability of thin film deposition. Custom sizes and thicknesses are supported, and they are compatible with various sputtering equipment, providing reliable material support for scientific research and industrial applications.
Q3: Can the size, thickness, and purity of the targets be customized?
A3: Yes, we support 99.99% high-purity targets. Size and thickness can be customized according to customer needs, adapting to different sputtering equipment.
Q4: How should CdO sputtering targets be stored to maintain performance? A4: It is recommended to store in a dry, cool, and dark environment, avoiding moisture and oxidation to maintain the electrical conductivity and thin film deposition performance of the target material.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports available upon request
We possess advanced CdO sputtering target manufacturing processes, a rigorous quality management system, and stable global supply capabilities. Combined with high batch consistency, customizable services, and professional technical support, we provide reliable and stable sputtering targets for research institutions and industrial clients, making us an ideal partner for the development of transparent conductive thin films and optoelectronic materials.
Chemical formula: CdO
Molecular weight: 128.41 g/mol
Appearance: Gray to brown solid
Density: Approx. 8.15 g/cm³
Melting point: Approx. 1,550 °C
Boiling point: Approx. 1,750 °C
Crystal structure: Cubic (rock salt type, space group Fm-3m).
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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