ULPMAT

Barium Vanadium Oxide

Chemical Name:
Barium Vanadium Oxide
Formula:
BaVO3
Product No.:
56230800
CAS No.:
39416-30-3
EINECS No.:
Form:
Sputtering Target
HazMat:
Product ID Formula Purity Dimension Inquiry
56230800ST001 BaVO3 99.9% Ø 25.4 mm x 3.175 mm Inquire
56230800ST002 BaVO3 99.9% Ø 50.8 mm x 3.175 mm Inquire
56230800ST003 BaVO3 99.9% Ø 76.2 mm x 3.175 mm Inquire
56230800ST004 BaVO3 99.9% Ø 101.6 mm x 3.175 mm Inquire
56230800ST005 BaVO3 99.9% Ø 203.2 mm x 6.35 mm Inquire
56230800ST006 BaVO3 99.99% Ø 50.8 mm x 3.175 mm Inquire
56230800ST007 BaVO3 99.99% Ø 76.2 mm x 3.175 mm Inquire
Product ID
56230800ST001
Formula
BaVO3
Purity
99.9%
Dimension
Ø 25.4 mm x 3.175 mm
Product ID
56230800ST002
Formula
BaVO3
Purity
99.9%
Dimension
Ø 50.8 mm x 3.175 mm
Product ID
56230800ST003
Formula
BaVO3
Purity
99.9%
Dimension
Ø 76.2 mm x 3.175 mm
Product ID
56230800ST004
Formula
BaVO3
Purity
99.9%
Dimension
Ø 101.6 mm x 3.175 mm
Product ID
56230800ST005
Formula
BaVO3
Purity
99.9%
Dimension
Ø 203.2 mm x 6.35 mm
Product ID
56230800ST006
Formula
BaVO3
Purity
99.99%
Dimension
Ø 50.8 mm x 3.175 mm
Product ID
56230800ST007
Formula
BaVO3
Purity
99.99%
Dimension
Ø 76.2 mm x 3.175 mm

Barium Vanadium Oxide sputtering targets Overview

Barium Vanadium Oxide sputtering targets are specifically designed for thin film deposition processes. They feature high purity and excellent density, ensuring uniform film formation and consistent film quality. With a purity of up to 99.99% and extremely low impurity levels, they excel in the fabrication of functional ceramic thin films and electronic devices.

We offer Barium Vanadium Oxide sputtering targets in a variety of shapes and sizes, including round and rectangular shapes, which can be customized to meet customer needs. We also provide comprehensive after-sales support; please feel free to contact us with any questions.

Product Highlights

Purity: 99.9% to 99.99%
High density ensures uniform thin film growth
Customizable size and shape
Target bonding service available
Excellent chemical stability and mechanical properties

Applications of Barium Vanadium Oxide sputtering target

Functional ceramic thin films: Used for the production of high-performance perovskite oxide thin films for sensors, ferroelectric devices, and more.
Electronic devices: Excellent performance in semiconductor and electrocatalytic applications, suitable for the fabrication of high-performance thin-film transistors and electrodes.
Multifunctional optoelectronic materials: Used in photovoltaic and optical thin films to improve device efficiency and stability.

Reports

Each batch of BaVO₃ sputtering targets comes with a Certificate of Analysis (COA), Material Safety Data Sheet (MSDS), and relevant quality reports. We also offer third-party testing services to ensure product quality meets customer standards.

Molecular Formula: BaVO₃
Molecular Weight: 183.92 g/mol
Appearance: Dark green, dense ceramic target with a smooth surface
Density: Approximately 5.8 g/cm³ (close to theoretical density)
Melting Point: Approximately 1,300°C
Crystal Structure: Perovskite (orthorhombic or cubic, depending on preparation conditions)

Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.

Outer Packaging: Cartons or wooden crates selected based on size and weight.

SKU 56230800ST Category Brand:

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