Barium Titanium Tin Oxide sputtering targets are specifically designed for thin film deposition processes. They feature high purity and excellent density, ensuring uniform and consistent film deposition. Their 99.9% purity and extremely low impurity content make them excellent for applications in functional ceramics and electronic devices.
We offer Barium Titanium Tin Oxide sputtering targets in a variety of shapes and sizes, including round and rectangular shapes, which can be customized to meet customer needs. We also provide comprehensive after-sales service; please feel free to contact us with any questions.
Purity: 99.9%
High density ensures uniform thin film deposition
Customizable sizes and shapes
Target bonding services available
Excellent thermal and chemical stability
Functional ceramic thin films: Used for the production of high-performance perovskite-structured thin films, widely used in piezoelectric, ferroelectric, and sensor devices.
Electronic devices: Suitable for the fabrication of electronic components such as thin-film transistors and capacitors.
Optoelectronic materials: Used for the manufacture of multifunctional optoelectronic thin films, improving device efficiency and stability.
Each batch of BaTiSnO₃ sputtering targets comes with a Certificate of Analysis (COA), Material Safety Data Sheet (MSDS), and other relevant quality reports. We also offer third-party testing services to ensure product quality meets customer standards.
Molecular Formula: BaTiSnO₃
Molecular Weight: 285.70 g/mol
Appearance: Light yellow, dense ceramic target with a smooth surface
Density: Approximately 5.9 g/cm³ (close to theoretical density)
Melting Point: Approximately 1,400°C
Crystal Structure: Perovskite (primarily orthorhombic or tetragonal)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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