ULPMAT

Barium tin oxide

Chemical Name:
Barium tin oxide
Formula:
BaSnO3
Product No.:
565000
CAS No.:
12009-18-6
EINECS No.:
234-545-2
Form:
Sputtering Target
HazMat:
Class 6.1 / UN1564 / PG II
Product ID Formula Purity Dimension Inquiry
565000ST001 BaSnO3 99.9% Ø 25.4 mm x 3.175 mm Inquire
565000ST002 BaSnO3 99.9% Ø 50.8 mm x 3.175 mm Inquire
565000ST003 BaSnO3 99.9% Ø 76.2 mm x 3.175 mm Inquire
565000ST004 BaSnO3 99.9% Ø 76.2 mm x 6.35 mm Inquire
Product ID
565000ST001
Formula
BaSnO3
Purity
99.9%
Dimension
Ø 25.4 mm x 3.175 mm
Product ID
565000ST002
Formula
BaSnO3
Purity
99.9%
Dimension
Ø 50.8 mm x 3.175 mm
Product ID
565000ST003
Formula
BaSnO3
Purity
99.9%
Dimension
Ø 76.2 mm x 3.175 mm
Product ID
565000ST004
Formula
BaSnO3
Purity
99.9%
Dimension
Ø 76.2 mm x 6.35 mm

Barium tin oxide sputtering targets Overview

Barium tin oxide sputtering targets are designed specifically for advanced thin film deposition processes. They offer excellent chemical stability and crystal structure, ensuring high-quality and uniform deposited films. With a purity of 99.9%, their dense density significantly enhances the electrical and optical properties of the films, making them suitable for the deposition of a wide range of functional thin films.

We offer Barium tin oxide sputtering targets in a variety of shapes and sizes, including round and rectangular shapes, and can be customized to meet customer needs. We also provide comprehensive after-sales support to ensure worry-free use.

Product Highlights

Purity: 99.9%
High-density, dense structure ensures uniform thin film deposition
Customized sizes and shapes available
Target bonding available
Excellent chemical stability and crystal structure
Suitable for electronic devices, transparent conductive films, and functional oxides

Applications of Barium tin oxide sputtering target

Transparent conductive films: High-performance transparent conductive oxide (TCO) materials used in touch screens, OLEDs, and solar cells.
Functional oxide devices: Used in the production of thin film layers for advanced devices such as high-mobility electronic devices and gas sensors.
Transistor materials: Used as active layer materials in oxide semiconductor transistors. Solar cells: Used as electrodes or buffer layers, they improve device efficiency and stability.

Reports

Each batch of BaSnO₃ sputtering targets is provided with a detailed Certificate of Analysis (COA), Material Safety Data Sheet (MSDS), and other relevant test reports. Third-party quality testing is supported to ensure compliance with customer and industry standards.

Molecular Formula: BaSnO₃
Molecular Weight: 293.15 g/mol
Appearance: Light gray or off-white, dense ceramic target with a smooth, uniform surface
Density: Approximately 6.3 g/cm³ (close to theoretical density)
Melting Point: > 1,600°C
Crystal Structure: Cubic perovskite

Signal Word:
Warning
Hazard Statements:

H301 Toxic if swallowed.
H312 Harmful in contact with skin.
H315 Causes skin irritation.
H319 Causes serious eye irritation.
H331 Toxic if inhaled.
H335 May cause respiratory irritation.

Inner Packaging: Double-layer sealed plastic bags or aluminum foil bags for moisture and leakage protection.
Outer Packaging: Iron drum or fiber drum, depending on the weight, with reinforced sealed lid.
Hazard Packaging: UN-certified packaging compliant with regulations for hazardous materials transportation.

SKU 565000ST Category Brand:

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