Barium Oxide sputtering targets are high-performance ceramic materials designed specifically for thin film deposition processes. With a purity of 99.9%, they offer excellent density and stability, ensuring uniform film formation, good adhesion, and minimal impurities.
We offer Barium Oxide sputtering targets in a variety of shapes and sizes, including round and rectangular shapes, and can customize them to meet your specific needs. We also provide comprehensive after-sales technical support. If you have any questions during use, please feel free to contact us.
Purity: 99.9%
High density ensures uniform and stable thin films
Customizable size and shape to meet different process requirements
Target bonding services available
Excellent chemical stability and high-temperature resistance, suitable for vacuum and high-temperature environments
Optoelectronic devices: Used in thin film fabrication for light-emitting diodes (LEDs), lasers, and other applications, improving device performance
Optical thin films: Used as reflective layers and functional coatings to enhance the performance and durability of optical components
Semiconductor devices: Used as dielectric or other functional layer materials in specific processes
Sensors and energy devices: Used for thin film deposition in gas sensors, fuel cells, and other applications
We provide a detailed Certificate of Analysis (COA), Material Safety Data Sheet (MSDS), and other relevant test reports for each batch of BaO sputtering targets. We support third-party testing to ensure product quality and reliability.
Molecular Formula: BaO
Molecular Weight: 153.33 g/mol
Appearance: White, dense ceramic target with a smooth surface
Density: Approximately 5.7 g/cm³ (close to theoretical density)
Melting Point: Approximately 1923°C
Crystal Structure: Face-centered cubic (FCC)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
