Barium metal sputtering targets are high-performance metal targets designed specifically for thin film deposition processes. With a purity of up to 99.9%, they offer excellent density and uniformity, ensuring uniform film deposition, strong adhesion, and extremely low impurity levels.
We offer barium sputtering targets in a variety of shapes and sizes, including round and rectangular shapes, and can customize them to meet your specific needs. We also provide comprehensive after-sales support; please feel free to contact us if you have any questions.
Purity: 99.9%
High density ensures uniform thin film deposition
Customizable sizes and shapes to meet diverse needs
Target bonding services available
Suitable for semiconductor, optoelectronic, and functional thin film materials
Semiconductors: Used in optoelectronic devices and functional layer deposition due to their excellent conductivity and process compatibility.
Optoelectronics: Used in the fabrication of functional thin films in light-emitting devices and solar cells.
Functional Thin Films: Used in the preparation of optical coatings, sensors, and catalysts.
Each batch of barium sputtering targets is provided with a complete Certificate of Analysis (COA), Material Safety Data Sheet (MSDS), and relevant test reports. In addition, we support third-party testing to ensure stable and reliable product quality.
Molecular Formula: Ba
Molecular Weight: 137.33 g/mol
Appearance: Silvery-white metallic target with a smooth, dense surface
Density: Approximately 3.62 g/cm³ (close to theoretical density)
Melting Point: Approximately 727°
Crystal Structure: Body-centered Cubic (BCC)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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