Aluminum Yttrium Oxide Sputtering Target is a high-quality ceramic target material engineered for thin-film deposition applications demanding exceptional thermal stability, hardness, and chemical inertness. By combining the superior mechanical strength of alumina (Al₂O₃) with the excellent thermal and structural properties of yttrium oxide (Y₂O₃), this target is ideal for producing advanced coatings used in optics, electronics, and protective layers.
Manufactured from high-purity raw materials through advanced sintering and hot-pressing techniques, our Al₂O₃-Y₂O₃ sputtering targets offer excellent density, uniform microstructure, and consistent sputtering performance. We also offer comprehensive after-sales support—please feel free to contact us if you have any questions.
High purity aluminum yttrium oxide ceramic composite target (≥99.5%)
High density with low porosity for uniform sputtering
Excellent chemical and thermal stability during film deposition
Custom sizes and shapes available
Optical Coatings: Anti-reflective and protective coatings on lenses, displays, and mirrors
Electronic Devices: Dielectric layers and insulating films in microelectronics
Protective Films: Hard, wear-resistant coatings for cutting tools and mechanical parts
Thin Film Sensors: High-stability films for sensor and MEMS devices
Certificate of Analysis (COA)
Material Safety Data Sheet (MSDS)
Density and purity test reports
Third-party verification available upon request
As a reliable aluminum yttrium oxide sputtering target supplier, we deliver high-purity, high-density targets with excellent film uniformity and stable sputtering performance for advanced coating applications. Our products offer low impurity levels, customizable compositions, and precise dimensions, meeting the needs of optical coatings, semiconductors, and display technologies. With strict quality control and global, compliant delivery, we ensure consistent quality and dependable supply for your production.
Chemical Formula: Al₂O₃-Y₂O₃
Appearance: Dense, white ceramic target with smooth surface
Density: Typically 3.5–3.9 g/cm³ (depending on composition)
Melting Point: >2000 °C
Crystal Structure: Corundum (Al₂O₃) and cubic fluorite (Y₂O₃) phases
Thermal Conductivity: Moderate, suitable for stable sputtering conditions
Chemical Stability: Excellent resistance to oxidation and chemical attack
Not classified as hazardous
Inner packaging: Vacuum-sealed bag to protect against contamination and moisture.
Outer packaging: Carton or wooden box, depending on size and weight.
Fragile targets: Special protective packaging is used to ensure safe transport.
If you need any service, please contact us
