Aluminum Titanium Alloy Sputtering Target is a high-quality aluminum-titanium alloy target designed for advanced thin-film deposition applications requiring a balance of aluminum’s lightweight conductivity and titanium’s excellent strength, corrosion resistance, and thermal stability.
Manufactured with ultra-high-purity raw materials and precise alloying techniques, our AlTi sputtering targets offer uniform composition, high density, and minimal impurities, ensuring reliable sputtering performance and superior film quality. We also offer comprehensive after-sales support—please feel free to contact us if you have any questions.
Product Highlights
Purity: ≥99.9%
Customizable Al-Ti compositions to meet application needs
High density and purity for consistent sputtering
Excellent corrosion resistance and thermal stability
Improved mechanical strength and wear resistance
Uniform microstructure for consistent film uniformity and adhesion
Available in various shapes and sizes (circular, rectangular, custom)
Applications of AlTi Sputtering Target
Semiconductor thin films
Aerospace and automotive coatings
Protective and wear-resistant coatings
Electronic packaging and interconnects
Optical coatings
Reports
Each shipment includes:
Certificate of Analysis (COA)
Material Safety Data Sheet (MSDS)
Third-party testing available on request
Research and Development
We continuously improve alloy compositions and fabrication processes to meet the evolving demands of high-performance thin-film applications.
Why Choose Us?
High Purity: ≥99.9% pure aluminum and titanium
Custom Alloying: Tailored Al-Ti ratios for optimal performance
Precision Manufacturing: Uniform density and minimal impurities
Technical Support: Assistance with material selection and sputtering optimization
Global Service: Fast delivery and full export documentation
FAQ
Q1: Can the Al-Ti ratio be customized?
A1: Yes, we offer custom alloy compositions based on client requirements.
Q2: What shapes and sizes are available?
A2: Circular, rectangular, and custom sizes are available.
Q3: Are samples provided?
A3: Yes, samples are available upon request.
Q4: Which industries use AlTi sputtering targets?
A4: Semiconductor, aerospace, automotive, and protective coating industries.
Chemical Formula: AlTi
Appearance: Metallic target with polished surface
Density: Approx. 2.8–4.5 g/cm³ (depending on Ti content)
Melting Point: Approx. 600–1660 °C (composition dependent)
Crystal Structure: Combination of Face-Centered Cubic (FCC) aluminum and Hexagonal Close-Packed (HCP) titanium phases
Magnetic Properties: Non-magnetic
Corrosion Resistance: Excellent, enhanced by titanium addition
Chemical Reactivity: Stable under typical sputtering conditions
Not classified as hazardous
Inner packaging: Vacuum-sealed bag to protect against contamination and moisture.
Outer packaging: Carton or wooden box, depending on size and weight.
Fragile targets: Special protective packaging is used to ensure safe transport.
If you need any service, please contact us
