Aluminum rotary targets are high-performance materials specifically designed for continuous thin-film deposition processes. With purities reaching up to 99.999% and excellent density, they ensure uniform film formation, strong adhesion, and minimal impurity levels.
Our high purity aluminum rotary sputtering targets are available in various sizes and can be fully customized to meet specific requirements. We also provide comprehensive after-sales support—please feel free to contact us if you have any questions regarding their use.
Purity: ≥99.99% to 99.999%
High density for uniform film deposition
Customizable sizes and shapes
Semiconductors: Used for interconnects and contact layers due to excellent conductivity and process compatibility.
Flat Panel Displays: Applied as reflective or electrode layers in LCD and OLED displays.
Photovoltaics: Serves as a back electrode in thin-film solar cells, offering high reflectivity and stability.
Optical Coatings: Forms high-reflectivity or functional coatings on lenses, mirrors, and optical components.
We provide a Certificate of Analysis (COA), Material Safety Data Sheet (MSDS), and other relevant reports with each shipment. Additionally, we support third-party testing for added quality assurance.
Chemical Formula: Al
Appearance: Silvery-white metallic
Density: 2.70 g/cm³
Melting Point: 660.3 °C
Boiling Point: 2,470 °C
Thermal Conductivity: 235 W/m·K
Electrical Conductivity: 3.77 × 10⁷ S/m
Specific Heat Capacity: 0.897 J/g·K
Thermal Expansion Coefficient: 23.1 × 10⁻⁶ /K
Crystal Structure: Face-Centered Cubic (FCC)
Magnetic Properties: Non-magnetic
Not classified as hazardous
Inner packaging: Vacuum-sealed bag to protect against contamination and moisture.
Outer packaging: Carton or wooden box, depending on size and weight.
Fragile targets: Special protective packaging is used to ensure safe transport.
If you need any service, please contact us
